Contact pressure effects on pole tip recession and head stain in linear digital tape systems

Shi, Baoping; Wild, M.A.; Sullivan, J. L.; Saied, S.O.

doi:10.1016/j.triboint.2005.01.017

Cited by 2 publications

(1 citation statement)

References 16 publications

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“…The analyses were conducted in a VG ESCALAB 200D electron spectrometer equipped with a hemispherical sector energy analyser. Details of the XPS conditions can be found in [15]. XPS Survey scans were first recorded for all samples at analyser take-off angles of 0 • (normal to the surface) and then narrow region energy scans were collected for all the elements identified on the surface.…”

Section: Characterizationmentioning

confidence: 99%

An investigation into which factors control the nanotribological behaviour of thin sputtered carbon films

Shi¹,

Sullivan²,

Beake³

2008

J. Phys. D: Appl. Phys.

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Ultra-thin (20–100 nm) films deposited on Si surfaces can improve their mechanical and tribological properties. As a stepping stone towards the optimization of such ultra-thin films, herein we report experimental nanoscratch and nanowear data on a-C films of thickness in the range 200–1000 nm on Si aiming to (1) understand the role of film thickness on the nanoscratch behaviour, (2) determine whether the same factors (substrate bias, H/E ratio, etc) are at play for thick films as for the thin films, (3) determine possible design rules for thinner films enabling their optimization for MEMS applications and (4) evaluate the use of the multi-pass (3-scan) procedure for clarifying the locus of failure. To a first approximation, the critical load for total film failure in the nanoscratch test is proportional to thickness provided the films are not too stressed. a-C films of 1 µm with very high H/E, deposited under high substrate bias, perform well at low load but very poorly in more highly loaded situations. Not only do they exhibit low critical loads but also failure involves extensive delamination outside of the scratch track. This is not observed on thinner films. A suitable strategy for optimizing wear resistance for thin films for MEMS applications is to aim to maximize H/E. For the 200 nm films studied here, the films with the highest H/E showed slightly improved scratch resistance.

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Section: Characterizationmentioning

confidence: 99%

An investigation into which factors control the nanotribological behaviour of thin sputtered carbon films

Shi¹,

Sullivan²,

Beake³

2008

J. Phys. D: Appl. Phys.

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A Study of Thin Coating Wear in High Data Density Tape Heads

Shi

Sullivan

Saied

et al. 2008

Journal of ASTM International

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This paper reports on an investigation of the wear of very thin (20–50 nm) Cr2O3 hard coatings, deposited on the linear tape open (LTO) data tape heads. The differential wear of the magnetic poles on the head and subsequent pole tip recession (PTR) leading to an increase in magnetic spacing is the major factor limiting the performance of high data density data tape heads. In order to reduce or eliminate PTR, very thin Cr2O3 hard coatings were employed to reduce PTR. The coatings were deposited on the LTO heads surface using unbalanced magnetron sputtering deposition techniques. Atomic force microscopy was used to analyze the surface topography of the coated head surface. Wear measurement was carried out by the means X-ray photoelectron spectroscopy and Auger electron spectroscopy combined with argon ion depth profiling. By these means, the very small reduction in coating thickness during the wear and hence the wear rate could be accurately determined. Wear tests were conducted in modified HP LTO Ultrium Generation 1 tape drives, and it is shown that wear rates of below 5.6×10−21m3/N⋅m could be measured. Nano indentation and scratch tests were employed to study the wear of the head materials and coated heads, which indicated that pole materials suffer the greatest wear under the same wear test conditions. The coatings on the pole areas have the lowest anti-abrasive wear resistance. Compared to the uncoated heads, the PTR of LTO heads were significant reduced by Cr2O3 coatings.

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Contact pressure effects on pole tip recession and head stain in linear digital tape systems

Cited by 2 publications

References 16 publications

An investigation into which factors control the nanotribological behaviour of thin sputtered carbon films

An investigation into which factors control the nanotribological behaviour of thin sputtered carbon films

A Study of Thin Coating Wear in High Data Density Tape Heads

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