2010 Proceedings of the 56th IEEE Holm Conference on Electrical Contacts 2010
DOI: 10.1109/holm.2010.5619521
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Contact Resistance in Flat-on-Flat and Sphere-on-Flat Thin Films

Abstract: The dependence of contact resistance on force between flat, thin-films is thought to be different than that in bulk materials [1]. Multiple mathematical and finite element models have attempted to model this dependence but have been limited in the ranges over which they are valid [1,2]. Experimental results have shown that the contact resistance between flat, thin films is greater than that predicted by Holm theory when the Holm equivalent radius is greater than the film thickness for gold films of thicknesses… Show more

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Cited by 4 publications
(1 citation statement)
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“…Therefore, if the non-noble contact finish is chosen, the surface films formed on the non-noble metal or alloy need to be disrupted in order to form good metal-to-metal contact upon mating and ensure that the contact interface does not reoxidize during the life-time of the connector. [1][2][3][4][5][6] This article focuses on using galling resistant silver alloys as nonnoble metal contact finishes. The purpose of this work was to develop a cost-effective and cyanide-free "self-lubricated" silver alloy deposited using pulse electrodeposition process for silver-based contact finishes for electrical contacts applications.…”
mentioning
confidence: 99%
“…Therefore, if the non-noble contact finish is chosen, the surface films formed on the non-noble metal or alloy need to be disrupted in order to form good metal-to-metal contact upon mating and ensure that the contact interface does not reoxidize during the life-time of the connector. [1][2][3][4][5][6] This article focuses on using galling resistant silver alloys as nonnoble metal contact finishes. The purpose of this work was to develop a cost-effective and cyanide-free "self-lubricated" silver alloy deposited using pulse electrodeposition process for silver-based contact finishes for electrical contacts applications.…”
mentioning
confidence: 99%