2022
DOI: 10.1016/j.physe.2022.115264
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Contamination-induced inhomogeneity of noise sources distribution in Al2O3-passivated quasi-free-standing graphene on 4H-SiC(0001)

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Cited by 9 publications
(4 citation statements)
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“…In the low-temperature region, the difference between the 1/f noise magnitudes of samples is more substantial and exceeds one order of magnitude. On this basis, it can be claimed that the noise measurement is more sensitive to local effects [9] (i.e., high local inhomogeneous current) than average quantities such as sheet resistance, which is comparable for both samples. More studies are needed, including a batch of samples with different doping and mobility, to reveal the origin of the fluctuations.…”
Section: Resultsmentioning
confidence: 96%
See 1 more Smart Citation
“…In the low-temperature region, the difference between the 1/f noise magnitudes of samples is more substantial and exceeds one order of magnitude. On this basis, it can be claimed that the noise measurement is more sensitive to local effects [9] (i.e., high local inhomogeneous current) than average quantities such as sheet resistance, which is comparable for both samples. More studies are needed, including a batch of samples with different doping and mobility, to reveal the origin of the fluctuations.…”
Section: Resultsmentioning
confidence: 96%
“…In this experiment, two measurements were made at the diagonal contacts, AC and BD, for each sample. Changing the contacts' role from driving to sensing should not change the measured noise magnitude if noise originated from resistance fluctuations [8][9][10]. This so-called reciprocity rule holds for both SL structures, which means that: (i) contact noise does not contribute to the total measured noise, (ii) fluctuations originate from mobility or carrier concentration.…”
Section: Resultsmentioning
confidence: 99%
“…QFS graphene [ 26 , 27 , 28 , 29 ] necessary for the graphene-based HTHS was grown on semi-insulating high-purity on-axis 4H-SiC(0001) (Cree Inc.) in a hot-wall Aixtron VP508 reactor using the epitaxial Chemical Vapor Deposition method [ 30 ], with thermally decomposed propane as a carbon source and in situ hydrogen atom intercalation [ 31 ]. The substrate was processed into a 1.6 mm × 1.6 mm Hall effect structure featuring a cross-shaped [ 32 ] 100 m × 300 m graphene mesa and four Ti/Au (10 nm / 60 nm) ohmic contacts, all passivated with a 100 nm-thick aluminum oxide (Al 2 O 3 ) layer synthesized from trimethylaluminum (TMA) and deionized water at 670 K in a Picosun R200 Advanced Atomic Layer Deposition (ALD) reactor [ 33 , 34 ]. Detailed information on the fabrication processes is included in Refs.…”
Section: Methodsmentioning
confidence: 99%
“…An alternative could be to employ atomic layer deposition (ALD). The technique is well suited to grow highquality continuous films and has already found extensive use in the fabrication of electronic devices [54][55][56][57][58]. However, the main drawback of ALD use with TMDs is that it often requires coordinatively unsaturated surface sites to initiate the growth process.…”
Section: Introductionmentioning
confidence: 99%