Contamination Removal From UV and EUV Photomasks

Identification and classification of particle contaminants on photomasks based on individual-particle Raman scattering spectra and SEM images

“…6 However, for the sub-resolution size of 40 nm on the mask (corresponding to 22 nm nodes and below), the allowable particle size is 18 nm. 39 Therefore, detection techniques for smaller nodes need to be further developed.…”

Renewable Single-Walled Carbon Nanotube Membranes for Extreme Ultraviolet Pellicle Applications

“…It is worth noting that most of the recently proposed methods to purify pellicles inevitably result in their partial damage [11,12,22,24,25,27,45,46], while our technique was shown to keep the original structure of the SWCNT membranes (Fig. 3d; Fig.…”

Photomask contamination standards for defect inspection and review applications

“…'Soft defects,' a.k.a. 'fall-on defects,' which originate from a variety of sources, can typically be removed with mask cleaning tools/processes between mask fabrication process steps to prevent transformation to hard defects at subsequent steps 2 . Whether a defect is removed by repair or cleaning, it must first be detected and located via mask inspection.…”