“…Simple microstructures can be fabricated by diamond milling [5], but limited resolution restricts applications to relatively smooth, slowly-varying relief structures. Direct writing in photoresist by a focused laser beam, in which accurate control of the process parameters enables a complex continuous-relief microstructure to be fabricated in a single exposure scan and development step, has been shown to produce excellent results [2,6]. A similar approach using e-beam writing has also been investigated [7,8] but requires significantly more complex (expensive) equipment and, with the exception of high-resolution microstructures with submicron feature sizes, has not shown any significant advantage over laser writing for the fabrication of microoptical elements.…”