Continuous roll-to-flat thermal imprinting process for large-area micro-pattern replication on polymer substrate

Lan, Shuhuai; Song, Jung‐Han; Lee, Moon Gu; Ni, Jun; Lee, Nak Kyu; Lee, Hye-Jin

doi:10.1016/j.mee.2010.07.021

Cited by 48 publications

(24 citation statements)

References 8 publications

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“…The R2R hot embossing experiments were supplemented by theoretical simulations, which are capable to describe the filling of the cavities by the polymer during the imprint process . The analytical model is based on the Navier–Stokes equation and the Hertzian contact pressure distribution.…”

Section: Theoretical Model For Calculating the Structure Heightmentioning

confidence: 99%

High‐Speed Roll‐to‐Roll Hot Embossing of Micrometer and Sub Micrometer Structures Using Seamless Direct Laser Interference Patterning Treated Sleeves

2017

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In this study, we present a seamless high-speed roll-to-roll hot embossing process using a direct laser interference patterned nickel sleeve as a mold. Line-like patterns with spatial periods of 5.0, 3.9, and 1.5 mm and structure heights of 572, 325, and 141 nm, respectively are used for imprinting PET-foils. The influence of the web speed on the cavity filling and consequently on the structure height and homogeneity of the fabricated patterns is studied. The web speed is varied between 2 and 50 m min À1 . For the 5.0 and 3.9 mm periods, a decrease in structure height with the web speed occurs, while for the 1.5 mm period the structure height remains constant in the tested interval. Also a decrease in homogeneity is observed with increasing web speed. Finally, an analytical model, based on the Navier-Stokes equation and Hertzian contact pressure, is used to explain the experimental results. The experimental data are in good agreement with the calculated theoretical values.

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Section: Theoretical Model For Calculating the Structure Heightmentioning

confidence: 99%

High‐Speed Roll‐to‐Roll Hot Embossing of Micrometer and Sub Micrometer Structures Using Seamless Direct Laser Interference Patterning Treated Sleeves

2017

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“…Yeo et al (2009) microfabricated a polymeric device using hot roller embossing that accounted for process parameters such as the embossing pressure, substrate preheating, roller temperature, 10 and roller speed. Lan et al (2010) performed a continuous roll-to-flat thermal imprinting process for large-area micro-pattern replication on polymer substrates and investigated a cavity-filling mechanism based on the Hertz contact pressure distribution and Navier-Stokes equation. 11 Kettle et al (2013) performed thermal imprint lithography for flexible, low-bandgap organic solar cells.…”

Section: Introductionmentioning

confidence: 99%

Suppression of thermal crown of heating roll for large area thermal imprint with consideration of thermal resistance between roll and shaft

Moon

Kim

Lee

2015

Int. J. of Precis. Eng. and Manuf.-Green Tech.

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Printed electronic circuits are becoming increasingly employed in flexible electronics such as radiofrequency (RF) antenna modules and organic solar cells. To achieve a high-efficiency module, very thin and small electrodes need to be produced with high throughput. This work reports on a heating roll design for the roll-to-roll (R2R) thermal imprinting process. Due to non-uniform thermal deformation of the roll, it is difficult to produce uniform electrodes throughout the large surface. This investigation focused on a thermo-mechanical design for the heating roll that improves the uniformity of its temperature and thermal deformation. This paper presents the design procedure and fabrication process of the R2R thermal imprinting. Applying this method for optimizing the heating roll will contribute to large area imprinting and high uniformity.

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“…However, the conventional NIL method using plate-to-plate (P2P) contact is not suitable for large area imprinting due to its high-force [12] and vacuum environment requirements [7,9], low throughput [13,14] and non-uniformity issues [15].…”

Section: Introductionmentioning

confidence: 99%

“…To overcome the issues, recent NIL development has tended to focus on roller-based NIL process, which is more advantageous as it requires low imprint force, yields higher throughput and better uniformity without the need for vacuum environment [13,15,16]. Its suitability for large area imprinting also observed the roller-based NIL processes being widely applied in industries for the fabrication of flexible electronics as seen in the work of Zang and Liang from SiPix Inc. [17], J-G. Kim [8].…”

Section: Introductionmentioning

confidence: 99%

Development of a low cost roll-to-roll nanoimprint lithography system for patterning 8-inch wide flexible substrates

Mohamed

Kooy

Ibrahim

2014

IJNT

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Recent developments in flexible electronics, solar cells, displays, bio-chips and wearable technology have featured various micro/nanostructures in system designs. However, fabricating these micro/nanostructures on flexible substrates using existing technology such as photolithography, electron beam lithography (EBL) and other lithography techniques is troublesome, time consuming and costly. An in-house roll-to-roll ultraviolet nanoimprint lithography (R2R-UVNIL) system was designed and fabricated as an alternative low cost and large area patterning tool. It consists of a coating unit, soft-bake unit and imprinting unit which are connected together using a series of rollers. The aim of the integrated soft-bake stage was to minimise the mould sticking issues during the continuous R2R imprinting using solvent-based resist. The assembled R2R-UVNIL system was tested with imprinting process on an untreated commercial polyethylene terephthalate (PET) film as the flexible substrate, solvent-based SU8-2002 photopolymer as the resist and PDMS soft mould as the imprinting mould. The PDMS soft mould was replicated from an EBL patterned silicon master mould. Imprinting speeds of 50 to 150 mm/min have been achieved in this work, with relatively sound replication quality and formability for patterning sub-2 µm microstructures.

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Continuous roll-to-flat thermal imprinting process for large-area micro-pattern replication on polymer substrate

Cited by 48 publications

References 8 publications

High‐Speed Roll‐to‐Roll Hot Embossing of Micrometer and Sub Micrometer Structures Using Seamless Direct Laser Interference Patterning Treated Sleeves

High‐Speed Roll‐to‐Roll Hot Embossing of Micrometer and Sub Micrometer Structures Using Seamless Direct Laser Interference Patterning Treated Sleeves

Suppression of thermal crown of heating roll for large area thermal imprint with consideration of thermal resistance between roll and shaft

Development of a low cost roll-to-roll nanoimprint lithography system for patterning 8-inch wide flexible substrates

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