Continuum modeling of particle redeposition during ion-beam erosion

Abstract

Abstract. We thoroughly investigate the impact of redeposition on the self-organized pattern formation during ion-beam erosion within the framework of a spatially two-dimensional continuum model. An analysis on prestructured patterns allows the extraction of general properties of this mechanism, the typical distribution of redepositing particles and approximations in terms of the surface height in particular. By combining the redeposition model with erosion models, we present detailed results about the impact of redeposition on spatio-temporal surface evolutions. It is shown that redeposition can play a decisive role for pattern formation under ion-beam erosion within an extended range in the parameter space.

Continuum modeling of particle redeposition during ion-beam erosion

“…Sinceb K < 0 holds, the Bradley-Harper effect enhances the damping effect of the redeposition mechanism on the surface basic mode, whereasĉ K is positive for all configurations. The results are similar to our one-dimensional investigation of the redeposition mechanism [52].…”

“…which is slightly less tilted in downhill direction in comparison to the model for f 1d skew investigated in our onedimensional article [52].…”

“…Since the one-dimensional variant of F R can be considered as a limiting case of the two-dimensional model, all findings discussed in our article [52] can also be interpreted as the results stemming from physically realistic two-dimensional surfaces.…”

“…We address assumptions made in the derivation, invariances and symmetries as well as specific limits and the relation to our one-dimensional redeposition model [52].…”

Self-organized nanopatterning of silicon surfaces by ion beam sputtering

“…Moreover, re-deposition has been recently argued to be an inherently non-linear effect [220]. In this connection, also recently Diddens and Linz have combined a non-local model for particle re-deposition with the KS equation using a sophisticated numerical integration model, to show that redeposition can stabilize and form well-ordered dot structures for a certain range of parameters in their model [221,222].…”