2006
DOI: 10.1016/j.mejo.2005.10.009
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Control ability of spin coating planarization of resist filmand optimal control of developers

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Cited by 12 publications
(6 citation statements)
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“…31,32 Besides its relatively low technical requirements, spin coating provides films with a sufficiently good degree of thickness homogeneity. 33 In an attempt to precisely determine the concentration corresponding to a maximal photocurrent, we varied the tin concentration in the spin coating solution. The incorporation of tin into the crystal structure of hematite films was directly confirmed by X-ray photoelectron spectroscopy (XPS) and indirectly manifested by changes in the intrinsic magnetic parameters (Morin temperature and N eel temperature) of hematite films.…”
Section: Introductionmentioning
confidence: 99%
“…31,32 Besides its relatively low technical requirements, spin coating provides films with a sufficiently good degree of thickness homogeneity. 33 In an attempt to precisely determine the concentration corresponding to a maximal photocurrent, we varied the tin concentration in the spin coating solution. The incorporation of tin into the crystal structure of hematite films was directly confirmed by X-ray photoelectron spectroscopy (XPS) and indirectly manifested by changes in the intrinsic magnetic parameters (Morin temperature and N eel temperature) of hematite films.…”
Section: Introductionmentioning
confidence: 99%
“…3: (Color online only) Upper (--) and lower (-) limit of the region where the liquid surface has to be before spinning (thick, blue online only) to end up in the BD region (thin, red online only) defined by equation (8). Note that there must be fluid outside of the initial region so that condition (11) is fulfilled during the spinning process lower limit (thick, solid blue line online only) has reached the rim of the hole, i.e., R t À = 1. Longer spin times than these are not allowed, since the dispensed layer cannot extend over the hole.…”
Section: Limitations and Possibilitiesmentioning
confidence: 99%
“…9,10 More applied studies aim at controlling the process to achieve even films for production of microelectronics by different means. [11][12][13] The particular case of spin coating of BDs has also been studied 14 and this work will be returned to later on.…”
Section: Introductionmentioning
confidence: 99%
“…The stability in a thin film during spin coating has received much attention due to its wide application in the MEMS technology and thin film materials technology [1][2][3][4]. A great number of theoretical studies and numerical analysis [5] which is related to rotating disk have been carried out for various fluids and the excellent comprehensive review has been conducted by Rajagopal [6].…”
Section: Introductionmentioning
confidence: 99%