2019
DOI: 10.1088/1361-6595/ab0984
|View full text |Cite
|
Sign up to set email alerts
|

Control of electron, ion and neutral heating in a radio-frequency electrothermal microthruster via dual-frequency voltage waveforms

Abstract: The development of low power micro-propulsion sources is of recent interest for application on miniature satellite platforms. Radio-frequency (rf) plasma electrothermal microthrusters can operate without a space-charge neutralizer and provide increased control of spatiotemporal power deposition. Further understanding of how the phase-resolved rf plasma heating mechanisms affect the phase-averaged bulk plasma properties, e.g. neutral gas temperature, could allow for in-flight tailoring of plasma thrusters. In t… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

4
16
0

Year Published

2019
2019
2024
2024

Publication Types

Select...
6

Relationship

3
3

Authors

Journals

citations
Cited by 7 publications
(20 citation statements)
references
References 65 publications
(123 reference statements)
4
16
0
Order By: Relevance
“…A depth of field of 24 mm, corresponding to the axial length of the source region, was applied to the simulated PROES images through a top hat integration along the line of sight 47 . Previous work has demonstrated agreement between the measured and simulated phase-resolved, Ar(2p 1 ) electron impact excitation rates in this source 22,36 . Here, experimental comparisons are presented for 13.56 MHz, 27.12 MHz and 40.68 MHz applied voltage frequencies at an applied voltage amplitude of φ rf = 450 V. Additional simulations are employed to draw conclusions up to 108.48 MHz.…”
Section: Plenum Rfsupporting
confidence: 66%
See 2 more Smart Citations
“…A depth of field of 24 mm, corresponding to the axial length of the source region, was applied to the simulated PROES images through a top hat integration along the line of sight 47 . Previous work has demonstrated agreement between the measured and simulated phase-resolved, Ar(2p 1 ) electron impact excitation rates in this source 22,36 . Here, experimental comparisons are presented for 13.56 MHz, 27.12 MHz and 40.68 MHz applied voltage frequencies at an applied voltage amplitude of φ rf = 450 V. Additional simulations are employed to draw conclusions up to 108.48 MHz.…”
Section: Plenum Rfsupporting
confidence: 66%
“…The sheath extension is calculated as in Ref. 36, where the radial sheath edge S R is determined as the radius R that satisfies the Brinkmann criterion 37 .…”
Section: Experimental Methods and Simulation Modelmentioning
confidence: 99%
See 1 more Smart Citation
“…The use of tailored voltage waveforms in low-pressure ( 67 Pa, 0.5 Torr) planar rf-CCP sources is already well established 21,[36][37][38][39][40][41][42] , where application of the EAE has enabled enhanced control of the ion energy while maintaining near-constant ion flux through a modulation of the dc self-bias voltage 15,17,28,43 . Recently, work has begun to focus application in intermediate pressure discharges (≈ 133 Pa, 1 Torr) 24,44,45 , atmospheric pressure discharges 26,[46][47][48][49][50] , and non-planar geometries 32,41,51 .…”
Section: Introductionmentioning
confidence: 99%
“…As such, variation of the dc self-bias voltage in a HC source cannot typically be achieved without a corresponding change in ion flux 51 . Similar behavior in the ion flux is observed when transitioning from low pressure discharges to intermediate pressure discharges 26,32 .…”
Section: Introductionmentioning
confidence: 99%