“…The use of tailored voltage waveforms in low-pressure ( 67 Pa, 0.5 Torr) planar rf-CCP sources is already well established 21,[36][37][38][39][40][41][42] , where application of the EAE has enabled enhanced control of the ion energy while maintaining near-constant ion flux through a modulation of the dc self-bias voltage 15,17,28,43 . Recently, work has begun to focus application in intermediate pressure discharges (≈ 133 Pa, 1 Torr) 24,44,45 , atmospheric pressure discharges 26,[46][47][48][49][50] , and non-planar geometries 32,41,51 .…”