2008
DOI: 10.1021/ma800848b
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Control of Orientational Order in Block Copolymer Thin Films by Electric Fields: A Combinatorial Approach

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Cited by 28 publications
(31 citation statements)
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“…This can be seen in Fig. 2a, which shows SFM images of a thin S 47 H 10 M 43 82 film annealed for [20]. Copyright 2008 American Chemical Society 6.5 h in saturated toluene vapor at a position between the gradient electrodes with an electric field strength of 2.5 V/μm.…”
Section: Control Of Orientational Order In Thin Filmsmentioning
confidence: 87%
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“…This can be seen in Fig. 2a, which shows SFM images of a thin S 47 H 10 M 43 82 film annealed for [20]. Copyright 2008 American Chemical Society 6.5 h in saturated toluene vapor at a position between the gradient electrodes with an electric field strength of 2.5 V/μm.…”
Section: Control Of Orientational Order In Thin Filmsmentioning
confidence: 87%
“…The error of P 2 due to inhomogeneities in the film and the phase contrast can be estimated to be about ±0.02. Reprinted with permission from Macromolecules [20]. Copyright 2008 American Chemical Society did not improve the orientational order significantly.…”
Section: Control Of Orientational Order In Thin Filmsmentioning
confidence: 99%
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“…A similar BCP with a short poly(hydroxyethyl methacrylate) (PHEMA) block as linker (PS-b -PHEMA-b -PMMA) that forms upstanding lamellae in thin fi lms, was shown to align above E c = 5.2 V μ m − 1 during solvent vapor annealing. [ 73 ] Mansky et al showed that by using an interdigitated electrode design, inplane alignment can be scaled up to the range of several centimeters. [ 68 ] By placing the capacitor setup directly in an atomic force microscope and applying the electric fi eld at the place of measurement, Olszowka et al observed the alignment mechanism of PS-b -PHEMA-b -PMMA lamellae quasi in situ .…”
Section: Block Copolymer Films In a Capacitor Analogymentioning
confidence: 99%
“…15 Routes to APPS include physical or chemical modification of surfaces. Physical methods normally include procedures involving electrical fields, [16][17][18][19] self-assembly of nanoparticles, [20][21][22][23][24][25] interfacial instabilities, [26][27][28][29][30] soft lithography, [31][32][33][34] etc. On the other hand, chemical approaches are mainly achieved by chemically grafting responsive self-assembled monolayers (SAMs) or polymer brushes onto surfaces to obtain responsive wettability and conductivity, etc.…”
Section: Introductionmentioning
confidence: 99%