2009
DOI: 10.1063/1.3183946
|View full text |Cite
|
Sign up to set email alerts
|

Control of plasma uniformity in a capacitive discharge using two very high frequency power sources

Abstract: Phase-shift effect in capacitively coupled plasmas with two radio frequency or very high frequency sources Very high frequency ͑VHF͒ capacitively coupled plasma ͑CCP͒ discharges are being employed for dielectric etching due to VHF's various benefits including low plasma potential, high electron density, and controllable dissociation. If the plasma is generated using multiple VHF sources, one can expect that the interaction between the sources can be important in determining the plasma characteristics. The effe… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
33
0

Year Published

2010
2010
2023
2023

Publication Types

Select...
9

Relationship

0
9

Authors

Journals

citations
Cited by 49 publications
(33 citation statements)
references
References 17 publications
0
33
0
Order By: Relevance
“…In the phase shift control method mentioned above, the frequency of the two VHF sources connected to the two electrodes is identical. In addition, Bera et al 62 indicated that multiple VHF sources at different frequencies can also control the plasma spatial profile, specifically when the plasma distributions at the individual frequencies are different. However, the underlying physics for the two cases is quite different.…”
Section: Multiple Vhf Sources Controlmentioning
confidence: 99%
“…In the phase shift control method mentioned above, the frequency of the two VHF sources connected to the two electrodes is identical. In addition, Bera et al 62 indicated that multiple VHF sources at different frequencies can also control the plasma spatial profile, specifically when the plasma distributions at the individual frequencies are different. However, the underlying physics for the two cases is quite different.…”
Section: Multiple Vhf Sources Controlmentioning
confidence: 99%
“…In recent years, several theoretical studies [6][7][8][9][10][11][12][13][14][15][16][17][18][19][20][21] and experimental research [22][23][24][25][26][27][28][29][30] have been published on the plasma characteristics in a CCP sustained by VHF sources. Lieberman et al 6 first employed a uniform slab model to investigate the standing-wave and skin effects in VHF discharges.…”
Section: Introductionmentioning
confidence: 99%
“…Besides, considerable effort has also been made on studying the discharge mechanisms with dual frequency excitation in the VHF regime. [15][16][17][18][19][20][21] Yang and Kushner 19-21 utilized a full-wave Maxwell solver, and studied the properties of plasmas sustained in Ar and Ar/ CF 4 at different discharge conditions.…”
Section: Introductionmentioning
confidence: 99%
“…11 If the discharge frequency is very high, in order to eliminate the standing wave effect, it is helpful to use a special electrode, for example, a lens-shaped electrode. 13 By applying graded conductivity electrodes, it also can improve the plasma uniformity significantly in VHF discharges. 13 By applying graded conductivity electrodes, it also can improve the plasma uniformity significantly in VHF discharges.…”
Section: Introductionmentioning
confidence: 99%