Control of surface charge for high‐fidelity nanostructuring of materials

Gervinskas, Gediminas; Seniutinas, Gediminas; Juodkazis, Saulius

doi:10.1002/lpor.201300093

Cited by 18 publications

(10 citation statements)

References 25 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…A novel approach to control surface charging in SEM via the photoelectric effect was proposed and demonstrated recently [8]. The technique was used previously to eliminate surface charging in high-precision FIB fabrication [115] and uses deep-UV coillumination during SEM imaging. Photons of the deep-UV light (~260 nm wavelength) have sufficient energy to liberate electrons from the sample surface reducing strong charge gradients.…”

Section: Surface Charge Removal By Deep-uv Illuminationmentioning

confidence: 99%

Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies

et al. 2017

Self Cite

View full text Add to dashboard Cite

The evolution of optical microscopy from an imaging technique into a tool for materials modification and fabrication is now being repeated with other characterization techniques, including scanning electron microscopy (SEM), focused ion beam (FIB) milling/imaging, and atomic force microscopy (AFM). Fabrication and in situ imaging of materials undergoing a three-dimensional (3D) nano-structuring within a 1−100 nm resolution window is required for future manufacturing of devices. This level of precision is critically in enabling the cross-over between different device platforms (e.g. from electronics to micro-/ nano-fluidics and/or photonics) within future devices that will be interfacing with biological and molecular systems in a 3D fashion. Prospective trends in electron, ion, and nano-tip based fabrication techniques are presented.

show abstract

Section: Surface Charge Removal By Deep-uv Illuminationmentioning

confidence: 99%

Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies

et al. 2017

Self Cite

View full text Add to dashboard Cite

show abstract

“…The 260 nm wavelength LED light has slightly lower photon energy than the work function of titania: 4.9 eV or equivalent to a 250 nm wavelength. However, electrons from any surface defects are efficiently excited at 260 nm as it was demonstrated in the case of Ga + -ion milling under DUV illumination 18 . SEM imaging has been tested under DUV co-illumination which is strongly absorbed at the surface.…”

Section: Resultsmentioning

confidence: 92%

Ultraviolet-photoelectric effect for augmented contrast and resolution in electron microscopy

2016

Self Cite

View full text Add to dashboard Cite

A new tool providing material contrast control in scanning electron microscopy (SEM) is demonstrated. The approach is based on deep-UV illumination during SEM imaging and delivers a novel material based contrast as well as higher resolution due to the photoelectric effect. Electrons liberated from illuminated sample surface contribute to the imaging which can be carried out at a faster acquisition rate, provide material selective contrast, reduce distortions caused by surface charging, and can substitute metal coating in SEM. These features provide high fidelity SEM imaging and are expected to significantly improve the performance of electron beam instruments as well as to open new opportunities for imaging and characterization of materials at the nanoscale.

show abstract

“…Here we demonstrated the unique merit of FIB beam milling due to long depth-of-focus by patterning on a 3D surface of an axicon. Fast and accurate FIB milling becomes feasible at high fabrication throughput by mitigation of surface charging [34]. Combination of the direct laser and ion-beam writing methods is promising for novel applications in 3D micro-and nano-photonics [35].…”

Section: Resultsmentioning

confidence: 99%

Hybrid curved nano-structured micro-optical elements

Balčytis¹,

Hakobyan²,

Gabalis³

et al. 2016

Opt. Express

View full text Add to dashboard Cite

Tailoring the spatial degree of freedom of light is an essential step towards the realization of advanced optical manipulation tools. A topical challenge consists of device miniaturization for improved performance and enhanced functionality at the micron scale. We demonstrate a novel approach that combines the additive three-dimensional (3D) structuring capability of laser polymerization and the subtractive subwavelength resolution patterning of focused ion beam lithography. As a case in point hybrid (dielectric/metallic) micro-optical elements that deliver a well-defined topological shaping of light are produced. Here we report on hybrid 3D binary spiral zone plates with unit and double topological charge. Their optical performances are compared to corresponding 2D counterparts both numerically and experimentally. Cooperative refractive capabilities without compromising topological beam shaping are shown. Realization of advanced designs where the dielectric architecture itself is endowed with singular properties is also discussed.

show abstract

Control of surface charge for high‐fidelity nanostructuring of materials

Cited by 18 publications

References 25 publications

Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies

Tipping solutions: emerging 3D nano-fabrication/ -imaging technologies

Ultraviolet-photoelectric effect for augmented contrast and resolution in electron microscopy

Hybrid curved nano-structured micro-optical elements

Contact Info

Product

Resources

About