Control of zinc oxide surface structure using combined atmospheric pressure-based CVD growth and plasma etching

Thomson, M.; Hodgkinson, John L.; Sheel, David W.

doi:10.1016/j.surfcoat.2013.06.032

Cited by 8 publications

(3 citation statements)

References 14 publications

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“…Use of FTO capped films with a thinner FZO layer should provide a top surface which would be suitable for wet chemical or plasma etching [18], allowing the surface morphology to be tuned for specific applications.…”

Section: Resultsmentioning

confidence: 99%

APCVD of dual layer transparent conductive oxides for photovoltaic applications

et al. 2015

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We report the atmospheric pressure chemical vapour deposition ( The bulk of the coating was FTO, providing the majority of conductivity and the large surface features associated with this material, whilst keeping the overall cost low by utilising the very fast growth rates achievable. The FTO was capped with a thinner FZO layer to provide a top surface suitable for wet chemical or plasma etching, allowing the surface morphology to be tuned for specific applications.

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Section: Resultsmentioning

confidence: 99%

APCVD of dual layer transparent conductive oxides for photovoltaic applications

et al. 2015

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“…Plasma etching at atmospheric pressure is not limited to polymer materials. Thomson et al showed that etching by atmospheric-pressure DBD plasmas is an effective method for controlling the ZnO surface morphology (Thomson, et al, 2013). Surface morphology is a critical parameter that determines the optical scattering properties of transparent conducting oxides in photovoltaic thin films.…”

Section: Etchingmentioning

confidence: 99%

Plasma-digital nexus: plasma nanotechnology for the digital manufacturing age

Hong

Murphy

Ashford

et al. 2020

Rev. Mod. Plasma Phys.

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Digital transformation in manufacturing is one of the key megatrends in the development of global economy and society. Three-dimensional (3D) printing is a transformative digital technology poised to disrupt manufacturing and supply chains across major industries. Here we critically examine relevant insights into current and emerging applications of plasma nanotechnology in printing, including 3D printing. Plasma devices operated at atmospheric pressure coupled with printing processes may help strengthen 3D printing as an emerging fabrication technology that morphs diverse metal powders, polymers, plastics and other materials into digitally designed 3D shapes and patterns. We discuss how plasma applications may help overcome current limitations of 3D printing in various fields, e.g. limitations of sculpting composite materials, lack of mechanical strength and the need for postprocessing. Our key focus is on the challenges, opportunities and physical mechanisms of the use of 3D printing in nano-manufacturing, defined as the fabrication of nanoscale building blocks, such as nanoparticles and nanomaterials; their assembly into higher-order (micro-scale) structures; and the integration of these structures into larger (macro-) scale devices and systems by controlling energy and matter at nanoscale. Moreover, we discuss the physico-chemical mechanisms that result in highlyconformal deposition of nanostructured materials onto 3D surfaces with microscopic (and possibly nanoscale) control of textures and inter-layer cross-linking, without the need for additional heating. We further highlight the arising opportunities for plasma nanotechnology to synergize with the emerging digital transformation platforms in surface micro-and nano-structuring using polymers, metals, metallic alloys, and other materials. These new findings in plasma-digital nanoscale fabrication may lead to a new digital manufacturing platform suitable for a number of cutting-edge applications in electronic, sensing and energy devices.

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“…The methods for changing the surface morphology of TCOs include wet, dry, and vapor etching, and a direct growing process can be used to form a light-trapping structure. The degree of reconstruction on the surface is determined by the haze value obtained from the ratio of the transmittance to diffuse transmittance as a function of the wavelength of light [ 3 , 4 , 5 , 6 , 7 , 8 , 9 ]. The improvement in the efficiency of a TF-Si solar cell such as a microcrystalline single junction or tandem cell has been proven to be extremely difficult when the TCO-etching method is applied, because of the weakness of scattering in the longer-wavelength region [ 10 , 11 ].…”

Section: Introductionmentioning

confidence: 99%

HF etched glass substrates for improved thin-film solar cells

Park

Kim

Jung

et al. 2018

Heliyon

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A hemisphere-array textured glass substrate was fabricated for the development of an improved thin-film (TF) silicon solar cell. The HF-H2SO4-etchant system influenced the light path owing to the formation of the strong fluorine-containing HSO3F acid. In particular, the etching system of the various HF concentration with a constant H2SO4 solution is related to make an improvement of optical transmittance and light trapping structure without a uniform pattern. According to the specular transmittance measurements, the haze ratio was maintained for the glass sample etched with 35% HF in the longer-wavelength region. The proposed substrate was implemented in a TF-Si solar cell, and an improved conversion efficiency was observed according to the short-circuit current density owing to the increase in the haze ratio. This morphology, therefore, induces more scattering at the front side of the cell and leads to an improvement of the open circuit voltage gain for the HF 25% cell. It will be helpful to understand the application of thin film solar cell based on the HF-H2SO4 etching system for the readers.

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Control of zinc oxide surface structure using combined atmospheric pressure-based CVD growth and plasma etching

Cited by 8 publications

References 14 publications

APCVD of dual layer transparent conductive oxides for photovoltaic applications

APCVD of dual layer transparent conductive oxides for photovoltaic applications

Plasma-digital nexus: plasma nanotechnology for the digital manufacturing age

HF etched glass substrates for improved thin-film solar cells

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