2014
DOI: 10.1080/10584587.2014.898552
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Controllable Growth of Functional Gradient ZnO Material Using Chemical Vapor Deposition

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Cited by 14 publications
(7 citation statements)
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“…These methods have a number of benefits, including the ability to fabricate composites with near-net shapes at low temperatures. Metals evaporate in the case of physical vapour deposition, depositing onto the substrate [23,[27][28][29][30][31].…”
Section: Chemical Vapour Deposition/infiltrationmentioning
confidence: 99%
See 1 more Smart Citation
“…These methods have a number of benefits, including the ability to fabricate composites with near-net shapes at low temperatures. Metals evaporate in the case of physical vapour deposition, depositing onto the substrate [23,[27][28][29][30][31].…”
Section: Chemical Vapour Deposition/infiltrationmentioning
confidence: 99%
“…During the CVD process, if the gas concentration and rate of flow of gas are modified, there is a change in microstructure, thickness of the material formed, and chemical composition. Wang et al [31] looked into the effect of modifying the rate of gas during the manufacturing of functionally graded ZnO materials used in semiconductors. In addition, the authors created one-and two-dimensional nanowires, concluding that, unlike 1D nanowires, 2D functionally graded ZnO growth was not constrained to a single direction.…”
Section: Chemical Vapour Deposition/infiltrationmentioning
confidence: 99%
“…Sputtering is a versatile and controllable technique capable of producing uniform, high-quality ZnO films with adjustable properties like thickness, morphology, crystallinity, and doping [21,22]. It can also be employed to create gradient structures of ZnO on CNTs, inducing a gradient in carrier concentration and enhancing the composite's photovoltaic response [23,24]. Furthermore, sputtering followed by subsequent thermal annealing can reduce defects, enhance crystallinity, and promote interfacial bonding, thereby improving the quality and performance of ZnO films [25,26].…”
Section: Introductionmentioning
confidence: 99%
“…[12,13] The CVD and PVD methods make it possible to obtain very thin gradient coatings. [14,15] By changing the process parameters, i.e., temperature, the chemical composition of the substrate, gas pressure, and energy of the bombardment ions, it is possible to obtain a controlled width and structure gradient. The gradient in composites obtained in the liquid phase is achieved by electroplating, plasma spraying, and eutectic reactions.…”
Section: Introductionmentioning
confidence: 99%