Controllable photopatterning and photochemical properties of novel copolymer containing dianthracene langmuir–blodgett films

Abstract

A new series of copolymer poly(N-hexadecylmeth acrylamide-co-bis(anthracen-9-ylmethyl) 2-allylmalonate) [poly(HDMA-co-DAnMAMA)]s containing swallow-tailed double anthracenyl groups and long alkyl group are designed and synthesized. The main route of the photochemical reaction of the p(HDMA-DAnMAMA)copolymer Langmuir-Blodgett (LB) films is dimerization reaction between the anthracenyl groups under the irradiation of both 365 and 248 nm for limiting irradiation time, resulting to a fine negative-tone pattern. On the other hand, the anthracenyl groups act just as photodecomposition group under 248 nm for longer irradiation time, resulting to a fine positive-tone pattern. Consequently, positive-tone and negative-tone pattern are obtained by choosing not only a suit-Additional Supporting Information may be found in the online version of this article.

Photo‐Controlled [4+4] Cycloaddition of Anthryl‐Polymer Systems: A Versatile Approach to Fabricate Functional Materials

“…On the contrary, the negative‐tone pattern is a consequence of photodimerization of anthracene groups that occurred at 365 nm. They later reported a similar LB film based on poly( N ‐hexadecylmethacrylamide‐ co ‐bis(anthracen‐9‐ylmethyl) 2‐allylmalonate) (p(HDMA‐ co ‐DAnMAMA)) [63] . Comparably, for (p(HDMA‐ co ‐DAnMAMA)), positive‐ and negative‐tone patterns were also generated upon irradiation at 248 and 365 nm, respectively.…”

“…They later reported a similar LB film based on poly(N-hexadecylmethacrylamide-cobis(anthracen-9-ylmethyl) 2-allylmalonate) (p(HDMA-co-DAnMAMA)). [63] Comparably, for (p(HDMA-co-DAnMAMA)), positive-and negative-tone patterns were also generated upon irradiation at 248 and 365 nm, respectively. The photopatterning mechanism was found to be dependent not only on the irradiation wavelength, but also on the length of exposure.…”