2018
DOI: 10.1126/science.aat8126
|View full text |Cite
|
Sign up to set email alerts
|

Controlled crack propagation for atomic precision handling of wafer-scale two-dimensional materials

Abstract: Although flakes of two-dimensional (2D) heterostructures at the micrometer scale can be formed with adhesive-tape exfoliation methods, isolation of 2D flakes into monolayers is extremely time consuming because it is a trial-and-error process. Controlling the number of 2D layers through direct growth also presents difficulty because of the high nucleation barrier on 2D materials. We demonstrate a layer-resolved 2D material splitting technique that permits high-throughput production of multiple monolayers of waf… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

1
245
0

Year Published

2019
2019
2023
2023

Publication Types

Select...
5
4

Relationship

0
9

Authors

Journals

citations
Cited by 258 publications
(246 citation statements)
references
References 36 publications
1
245
0
Order By: Relevance
“…Employing the interfacial toughness between Ni and WS 2 , higher than the vdW force between WS 2 layers, the top WS 2 layer is peeled off by sacrificial Ni layer. The epitaxial grown thick WS 2 layers is simply exfoliated into monolayer after covered by sacrificial Ni layers on both top and bottom sides . This layer‐resolved splitting technique demonstrates the precise isolation of monolayer 2D materials at the wafer scale, through which the wafer‐scale integration and fabrication of 2D devices can be fulfilled.…”
Section: Production Of 2dhsmentioning
confidence: 99%
“…Employing the interfacial toughness between Ni and WS 2 , higher than the vdW force between WS 2 layers, the top WS 2 layer is peeled off by sacrificial Ni layer. The epitaxial grown thick WS 2 layers is simply exfoliated into monolayer after covered by sacrificial Ni layers on both top and bottom sides . This layer‐resolved splitting technique demonstrates the precise isolation of monolayer 2D materials at the wafer scale, through which the wafer‐scale integration and fabrication of 2D devices can be fulfilled.…”
Section: Production Of 2dhsmentioning
confidence: 99%
“…Incorporating growth and processing techniques that are commonplace in the flexible electronics community such as low temperature vacuum deposition or rapid thermal/photonic annealing may provide the mechanisms necessary to incorporate high quality materials on soft and compliant substrates, which cannot accommodate high growth temperatures . Alternatively, the direct transfer of materials synthesized on conventional substrates (i.e., SiO 2 /Si or sapphire) to flexible ones, through 2D van der Waals liftoff using materials such as h ‐BN, have been shown to enable high performing flexible electronic systems and may provide the key to flexible, low power electronics based on elemental 2D materials …”
Section: Electronics and Sensingmentioning
confidence: 99%
“…Therefore, some researchers have been studying the large‐scale growth of 2D materials. For example, the implementation of high‐throughput production of wafer‐scale single atomic layer 2D materials . At the same time, they also realized high‐throughput manufacturing of 2D heterostructures at the wafer, which is of great practical significance for the integrated application of 2D materials.…”
Section: Low‐dimensional Semiconductor Nanomaterialsmentioning
confidence: 99%