Organic–inorganic metal halide perovskites have recently demonstrated outstanding efficiencies in photovoltaics as well as highly promising performances for a wide range of optoelectronic applications such as lasing, light emission, optical detectors, and even for radiation detection. Key to the realization of functional perovskite micro/nanosystems on the ubiquitous silicon optoelectronics platform is through sophisticated lithography. Despite the rapid progress made in halide perovskite lasing, direct lithographic patterning of perovskite films to form optical cavities on conventional substrates remains extremely challenging. This study realizes room‐temperature high‐quality factor whispering‐gallery‐mode lasing (Q ≈ 1210) from patterned lead halide perovskite microplatelets fabricated in periodic arrays on silicon substrate with micropatterned BN film as the buffer layer. By varying the size of the platelets, modal selectivity for single mode lasing can be achieved with different cavity sizes or by simply breaking the structural symmetry of the cavity through designing the pattern. Importantly, this work demonstrates a straightforward, versatile bottom‐up scalable strategy to realize high‐quality periodic perovskite arrays with variable cavity sizes for large‐area light‐emitting and optical gain applications.