1998
DOI: 10.1002/(sici)1099-0518(19980115)36:1<209::aid-pola26>3.0.co;2-m
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Controlled thermal degradation of polystyrene leading to selective formation of end-reactive oligomers

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Cited by 18 publications
(3 citation statements)
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“…Further, the rate of decomposition and the products of the decomposition process for such polymers are strongly temperature dependent. For example, although the decomposition of polystyrene in a vacuum peaks at 450 °C, the process can begin at below 300 °C (14) and the decomposition may favor the formation of higher vapor pressure oligomers at the lowest temperatures (18).…”
Section: What Are the Particles?mentioning
confidence: 99%
“…Further, the rate of decomposition and the products of the decomposition process for such polymers are strongly temperature dependent. For example, although the decomposition of polystyrene in a vacuum peaks at 450 °C, the process can begin at below 300 °C (14) and the decomposition may favor the formation of higher vapor pressure oligomers at the lowest temperatures (18).…”
Section: What Are the Particles?mentioning
confidence: 99%
“…1 Nevertheless, the carbon−carbon bonds that comprise the backbone of PS contribute to its environmental persistence and limit its opportunities for chemical recycling or upcycling. While PS thermoplastics can sometimes be dissolved for reprocessing, converted to styrene when heated above their ceiling temperature, 2 or engineered to thermally degrade into low molar mass fragments, 3 such processes are often energy-intensive, yield complex product mixtures, may not address environmental persistence, and do not apply to all forms of PS (e.g., copolymers, especially crosslinked variants) and other vinyl polymers.…”
Section: ■ Introductionmentioning
confidence: 99%
“…5 We prepared multiblock copolymers of IX,w-dihydrosilylpolydimethylsiloxane with these telechelic oligomers with different stereoregularities. 12 The degradation products are produced via various elementary reactions of secondary terminal macro- radicals in the depropagation step, as discussed previously. 5 A possible mechanism for the predominant formation of TVD of nonvolatile oligomers (polymer residue) is as follows: telechelic oligomers are formed by intramolecular hydrogen abstraction (back-biting) of secondary terminal macroradicals followed by f3 scission at the end of main chain and intermolecular hydro-Polym.…”
Section: Res Ul Ts and Discussionmentioning
confidence: 99%