2009
DOI: 10.1016/j.infrared.2009.09.004
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Controlling dark current in type-II superlattice photodiodes

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Cited by 40 publications
(21 citation statements)
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“…Another style of barrier is formed by grading the bandgap upward from the narrow gap in the absorber. 10 Most barrier designs require a nonzero bias voltage to extract the photocurrent. We still refer to these devices as photovoltaic, despite the substantial bias, because the minority carriers representing the signal must cross a p-n junction to reach the contact.…”
Section: Type II Superlattice Materialsmentioning
confidence: 99%
“…Another style of barrier is formed by grading the bandgap upward from the narrow gap in the absorber. 10 Most barrier designs require a nonzero bias voltage to extract the photocurrent. We still refer to these devices as photovoltaic, despite the substantial bias, because the minority carriers representing the signal must cross a p-n junction to reach the contact.…”
Section: Type II Superlattice Materialsmentioning
confidence: 99%
“…The surface component and the bulk component of the resistance-area product at zero bias, R 0 A, of a photodiode can be separated by doing the variable-area diode tests, which have been widely used for HgCdTe and InAs/GaSb T2SL structures [5,15,24,25]. The resistance due to the bulk effect R bulk and the resistivity of the surface currentrelated effect r surface can be evaluated through the tests.…”
Section: Resultsmentioning
confidence: 99%
“…(13)), while the diffusion current should be one band gap (see Eq. (12)) [15]. Taking the logarithm for the two sides of Eq.…”
Section: Resultsmentioning
confidence: 99%
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“…The present classifications for the different types of SLS detectors are somewhat ambiguous in that multiple and overlapping categories exist; however, in the following discussion, attempts will be made to clarify potential conflicts. In consideration of space constraints, other less common type II SLS detectors are not covered here in detail, which include, but are not limited to, the shallow etch mesa isolation (SEMI), a type of n-on-p graded-gap "W" photodiode structure [8]; hybrid superlattice (HSL) structure [81]; and strain-compensated InAs/AlInSb superlattice barrier (ALSL-B) [82].…”
Section: Overviewmentioning
confidence: 99%