Controlling garnet film composition by magnetic-field-controlled radio frequency magnetron sputtering

Abstract

To find a way to control the compositional change in Bi-substituted garnet during sputtering, we studied the effects of controlling the cathode magnetic field. The magnetic-field-controlled rf magnetron sputtering method that we developed can create a garnet film whose composition is the same as that of the sputtering target. When we deposited a film of Bi-substituted Dy iron garnet–ferrite (Bi2DyFe4GaO12) by this method, there was no compositional change between the target and the film even after a long sputtering process. Therefore, this sputtering method is effective at suppressing compositional change during the film formation process.

Refractive index change of multicomponent glass films for bismuthate erbium-doped waveguide amplifiers prepared by radio-frequency magnetron sputtering under different magnetic fields of cathode

“…However, achieving precise control of the refractive index of an optical film throughout the lifetime of the sputtering target and precise control of the film thickness is difficult. Some authors have described the relationship between deposition rate and magnetic field [13][14][15] or between film composition and magnetic field [16]. However, few studies have considered the ultra-precise technology for controlling the refractive index of a film, even for a simple component film.…”

Immersion Deposition of Metal Films on Silicon and Germanium Substrates in Supercritical Carbon Dioxide

“…The manufacture of thin films has been an area of significant importance in the microelectronics industry and related fields. A number of techniques have been established for depositing metal films on semiconductor substrates including electroless deposition, − electrodeposition, − immersion deposition, − sputtering, − chemical vapor deposition (CVD), − and evaporation. − Since the past decade, supercritical fluid deposition techniques have been extensively studied. − Supercritical fluids exhibit a unique combination of gaslike and liquidlike properties. They can dissolve solid compounds as liquids do, and they provide low viscosity and high diffusivity as gases do.…”

Hydrofluoric Acid-Free Electroless Deposition of Metals on Silicon in Ionic Liquids and Its Enhanced Performance in Lithium Storage

“…Deposition of metals onto semiconductors is important in microelectronic industries. Various techniques have been used for the deposition of metals on silicon such as electrodeposition, − electroless deposition in hydrofluoric acid (HF)-containing solution, − sputtering, , chemical vapor deposition (CVD), , and evaporation. − Among all these techniques, electroless deposition is a versatile technique that does not require additional energy. Furthermore, as silicon is a potential lithium-ion battery electrode, modifying the silicon electrode with noble metals by electroless deposition in the presence of HF has been shown to improve electronic conductivity as well as battery performance. , Etching of silicon takes place in the presence of HF, which generates electrons and reduces the metal salts present in the electrolyte.…”

“…10 Deposition of metals onto semiconductors is important in microelectronic industries. Various techniques have been used for the deposition of metals on silicon such as electrodeposition, 11−13 electroless deposition in hydrofluoric acid (HF)-containing solution, 13−16 sputtering, 17,18 chemical vapor deposition (CVD), 19,20 and evaporation. 21−23 Among all these techniques, electroless deposition is a versatile technique that does not require additional energy.…”