Controlling MegaSonic performance by optimizing cleaning media's physical and gaseous properties

Shende, Hrishi; Singh, Sherjang; Baugh, James; Dietze, Uwe; Dress, Peter

doi:10.1117/12.979342

Cited by 3 publications

(2 citation statements)

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“…Independent work with nozzle transducers have shown that the amount of pattern damage increases with electrical power delivered to the megasonic transducers [8,9]. However, no acoustical data is available to match the cleaning conditions.…”

Section: Discussionmentioning

confidence: 99%

“…Although there are several studies on particle removal and pattern damage at 1 MHz, there is very little known about the cavitation performance at frequencies above this value. Studies [2,3] showed that varying the frequency in the range of 1-4 MHz for DI water-based cleaning solutions, the damage was lowest at 4 MHz. This suggested a reduction in transient cavitation, although it has not been verified.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Acoustic characterization of two megasonic devices for photomask cleaning

Zanelli¹,

Dushyanth²,

Keswani

et al. 2016

SPIE Proceedings

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Section: Discussionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Acoustic characterization of two megasonic devices for photomask cleaning

Zanelli¹,

Dushyanth²,

Keswani

et al. 2016

SPIE Proceedings

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Mega-sonic effect on sub-resolution assit features during photomask cleaning

Xue

Shi

et al. 2018

2018 China Semiconductor Technology International Conference (CSTIC)

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Innovative Cr shrinking to improve tritone mask process and inspectability

Liao,

Gan,

Tian

et al. 2024

Photomask Technology 2024

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For mature technology node IC manufacturing, a simple Tritone mask is widely adopted with chrome (Cr) layer remained in Scribe line and border region. The fabrication of a Tritone mask uses a dual step process with an e-beam writer for the 1st writing and a laser beam writer for the 2nd one, which induces process shift and possible Cr residual defects of the 2nd exposure writing. In this paper, NewRay Mask Technology Corporation (NRMTC) proposes a new process with adequate Cr shrinking, which can decrease residual Cr on Mosi/Qz edge when the mask is inspected and qualified on the KLA TeraScan™ 597XRS mask inspection system with Tritone Die-to-Database inspection mode. Furthermore, we have illustrated two main factors that contributed to Cr shrinking and figured out the optimal shrinking distance based on Cr line residue analysis and registration results. Production mask verification also conducted with optimal Cr shrink distance, demonstrates that optimal Cr shrinking distance can effectively improve the defect inspection process and have extra benefits on Tritone mask inspectability.

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Controlling MegaSonic performance by optimizing cleaning media's physical and gaseous properties

Cited by 3 publications

References 0 publications

Acoustic characterization of two megasonic devices for photomask cleaning

Acoustic characterization of two megasonic devices for photomask cleaning

Mega-sonic effect on sub-resolution assit features during photomask cleaning

Innovative Cr shrinking to improve tritone mask process and inspectability

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