2024
DOI: 10.21203/rs.3.rs-5471272/v1
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Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating

Yanheshig Ba,
Wenhao Li,
Xinyu Wang
et al.

Abstract: The scanning interference field exposure technique is an effective method to fabricate holographic diffraction gratings with meter-level size and nano-level precision. The main problems of making large-aperture and high-precision gratings by this technique are the high-precision displacement measurement of the stage, the high-precision control of the interference field and the real time compensation of the grating phase deviation. In this paper, the influence of grating grooves position error on the wavefront … Show more

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