Copper doped nickel oxide transparent p-type conductive thin films deposited by pulsed plasma deposition

Yang, Minmin; Shi, Zhan; Feng, Jiahan; Pu, Haifeng; Li, Guifeng; Zhou, Jun; Zhang, Qun

doi:10.1016/j.tsf.2010.12.009

Cited by 49 publications

(22 citation statements)

References 29 publications

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“…NiO can be used as gas sensor, fuel cell electrodes, organic solar cells, transparent p-type conductive films, lithium-ion batteries and organic light-emitting devices [4][5][6][7][8][9].…”

Section: Introductionmentioning

confidence: 99%

Transformation nanostructured nickel hydroxide to nickel oxide film by aqueous chemical growth

Bakar

Hamid

Jalar

et al. 2013

AIP Conference Proceedings

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Articles you may be interested inDevelopment of a new laser heating system for thin film growth by chemical vapor deposition Rev. Sci. Instrum. 83, 094701 (2012); 10.1063/1.4748126On the growth of carbon nanofibers on glass with a Cr layer by inductively coupled plasma chemical vapor deposition: The effect of Ni film thickness Growth of β -SiC nanowires and thin films by metalorganic chemical vapor deposition using dichloromethylvinylsilane J.Abstract. Nickel hydroxide, [Ni(OH) 2 ] has been used extensively as the positive electrode material in rechargeable nickel-based batteries. Several approaches are known to be able for Ni(OH) 2 growth including dc reactive magnetron sputtering, chemical spray pyrolysis, thermal evaporation, etc. This study discusses about nanostructured Ni(OH) 2 film growth by aqueous chemical growth based technique. Ni(OH) 2 film grown at 150 °C has a coral-like morphology whereas converted to NiO film by oxidation of Ni(OH) 2 at 400 °C, confirmed by X-ray diffraction (XRD). Field Emission Scanning Electron Microscopy (FESEM) revealed a coral-like structure of Ni(OH) 2 were grown on the glass substrates. Flake-like morphology was obtained for NiO film. The XRD pattern reveals that the intensity of observed peaks increased with the longer reaction time and film thickness which indicated an improvement in crystallinity. The optical band gap for Ni(OH) 2 film calculated from transmission spectra increased from 3.72 eV to 3.91 eV with the increasing of reaction time. Higher optical band gap of 4.00 eV was obtained for NiO film. This result indicates that the Ni(OH) 2 /NiO films grown by aqueous chemical growth could to produce similar quality properties to other conventional methods either nanoparticle or bulk size.

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“…NiO can be used as gas sensor, fuel cell electrodes, organic solar cells, transparent p-type conductive films, lithium-ion batteries and organic light-emitting devices [4][5][6][7][8][9].…”

Section: Introductionmentioning

confidence: 99%

Transformation nanostructured nickel hydroxide to nickel oxide film by aqueous chemical growth

Bakar

Hamid

Jalar

et al. 2013

AIP Conference Proceedings

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“…It is to be mention that the reported electrical resistivity of RF magnetron-sputtered Cu 2 O and NiO films was 9.6 × 10 1 Ωcm and 8.0 × 10 5 Ωcm, and the equimolar Cu-Ni oxide films, it was 3.0 × 10 4 Ωcm [12]. Yang et al [11] achieved low electrical resistivity of 0.2 Ωcm in Ni 0.9 Cu 0.1 O films formed by pulsed plasma deposition and Chen et al [9] noticed that the resistivity decreased from 0.12 to 0.07 Ωcm with the increase of copper from 10 to 18 at% in RF magnetron-sputtered NiO films. In contrast to this, Kikuchi et al [25] reported that the electrical resistivity of the increase of sputter power from 3.1 to 5.1 W/cm 2 , thereafter, it decreased to 20 cm 2 /Vsec at higher sputter power of 6.1 W/cm 2 as shown in Figure 9.…”

Section: Atomic Force Micrograph Studiesmentioning

confidence: 98%

“…The electrical resistivity of the films also decreased with the increase in the content of copper in NiO films. Yang et al [11] reported electrical resistivity of 0.19 Ωcm and optical bandgap of 3.7 eV in ptype Ni 0.9 Cu 0.1 O films formed by pulsed plasma deposition. Miyata et al [12] deposited p-type Cu 2 O-NiO films with various concentrations of Cu 2 O by RF magnetron sputtering and found electrical resistivity of 2 × 10 4 Ωcm, hall mobility of 2.5 cm 2 /Vsec, and optical bandgap of 2.9 eV in 50% of copperdoped NiO films.…”

Section: Introductionmentioning

confidence: 99%

Sputter Power Influenced Structural, Electrical, and Optical Behaviour of Nanocrystalline CuNiO₂ Films Formed by RF Magnetron Sputtering

Sreedhar

Reddy

Uthanna

et al. 2013

ISRN Condensed Matter Physics

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Copper nickel oxide (CuNiO2) films were deposited on glass and silicon substrates using RF magnetron sputtering of equimolar Cu50Ni50 alloy target at different sputter powers in the range of 3.1–6.1 W/cm2. The effect of sputter power on the chemical composition, crystallographic structure, chemical binding configuration, surface morphology, and electrical and optical properties of CuNiO2 films was investigated. The films formed at sputter power of 5.1 W/cm2 were of nearly stoichiometric CuNiO2. Fourier transform infrared spectroscopic studies indicated the presence of the characteristic vibrational bands of copper nickel oxide. The nanocrystalline CuNiO2 films were formed with the increase in grain size from 75 to 120 nm as the sputter power increased from 3.1 to 5.1 W/cm2. The stoichiometric CuNiO2 films formed at sputter power of 5.1 W/cm2 exhibited electrical resistivity of 27 Ωcm, Hall mobility of 21 cm2/Vsec, and optical bandgap of 1.93 eV.

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“…24 The presence of low amounts of Cu in NiO (upon doping during the sputtering process) was recently found to have interesting applications in optoelectronic devices due to the enhanced electrical conductivity of the transparent NiO. 25 Low amounts of Ni being present in cuprous oxide thin films are also highly interesting for photovoltaic power generation; a suppression of the reduction process of CuO to Cu 2 O being attributed to the presence of Ni. 26 In the present work, a Cu-Ni oxide thin film combinatorial library produced by reactive sputtering from a Cu-Ni sectioned cathode is investigated.…”

Section: Introductionmentioning

confidence: 99%

Copper–nickel oxide thin film library reactively co-sputtered from a metallic sectioned cathode

et al. 2013

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A Cu-Ni sectioned cathode made up of two hemicycles of each of the metals was used for reactive co-sputtering of a thin film combinatorial library of Cu-Ni oxides covering a total compositional spread of 63 at.%. The thickness profiling of the library showed a nonuniform film thickness with a maximum region shifted toward the Cu side of the cathode. The presence of CuO, Cu 2 O, NiO, and metallic Cu-Ni alloys was identified during the scanning x-ray diffraction investigations along the compositional spread. A distinct structural zone was defined between Cu-14 at.% Ni and Cu-19 at.% Ni, where the scanning electron microscopy investigations showed a higher surface porosity combined with smaller grain sizes. This zone corresponds to the maximum film thickness region and correlates well with the position of the maximum work function of the Cu-Ni oxide films as mapped using a scanning Kelvin probe. During local corrosion studies focused on Cu dissolution, an improved corrosion resistance was identified in the Ni rich side of the compositional spread.

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Copper doped nickel oxide transparent p-type conductive thin films deposited by pulsed plasma deposition

Cited by 49 publications

References 29 publications

Transformation nanostructured nickel hydroxide to nickel oxide film by aqueous chemical growth

Transformation nanostructured nickel hydroxide to nickel oxide film by aqueous chemical growth

Sputter Power Influenced Structural, Electrical, and Optical Behaviour of Nanocrystalline CuNiO₂ Films Formed by RF Magnetron Sputtering

Copper–nickel oxide thin film library reactively co-sputtered from a metallic sectioned cathode

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Copper doped nickel oxide transparent p-type conductive thin films deposited by pulsed plasma deposition

Cited by 49 publications

References 29 publications

Transformation nanostructured nickel hydroxide to nickel oxide film by aqueous chemical growth

Transformation nanostructured nickel hydroxide to nickel oxide film by aqueous chemical growth

Sputter Power Influenced Structural, Electrical, and Optical Behaviour of Nanocrystalline CuNiO2 Films Formed by RF Magnetron Sputtering

Copper–nickel oxide thin film library reactively co-sputtered from a metallic sectioned cathode

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Sputter Power Influenced Structural, Electrical, and Optical Behaviour of Nanocrystalline CuNiO₂ Films Formed by RF Magnetron Sputtering