2003
DOI: 10.1016/s0257-8972(03)00681-9
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Correlation between SiOx content and properties of DLC:SiOx films prepared by PECVD

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Cited by 34 publications
(24 citation statements)
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“…These precursors might be gaseous (Silane -(SiH4) and oxygen (O2) mix) [44] , tetra methyle silane-TMS ((CH3)3SiH and oxygen mix) [45] or liquids Hexamethyle disiloxane HMDSO (C6H18OSi2) [46][47][48][49][50][51] , or tetraethoxysilane (TEOS, (C2H5O)4Si [52] , or tetraethylorthosilicate-TEOS (SiC8H20O4) [53,54,21] , hexa methyle disilane-HMDS (C6H18Si2) [55] and mixed siloxane and silazane precursors.…”
Section: Precursorsmentioning
confidence: 99%
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“…These precursors might be gaseous (Silane -(SiH4) and oxygen (O2) mix) [44] , tetra methyle silane-TMS ((CH3)3SiH and oxygen mix) [45] or liquids Hexamethyle disiloxane HMDSO (C6H18OSi2) [46][47][48][49][50][51] , or tetraethoxysilane (TEOS, (C2H5O)4Si [52] , or tetraethylorthosilicate-TEOS (SiC8H20O4) [53,54,21] , hexa methyle disilane-HMDS (C6H18Si2) [55] and mixed siloxane and silazane precursors.…”
Section: Precursorsmentioning
confidence: 99%
“…Stress can be further decreased by increasing the Si atomic concentartion [52] . Hardness and young modulus are decreased in DLN film in comparison with DLC film [22,45,46,53,54,58,59] .…”
Section: Mechanical Propertiesmentioning
confidence: 99%
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“…But the most reliable results about hydrogen concentration are obtained using other characterization techniques, such as Rutherford back scattering (RBS) and elastic recoil detection (ERDA). It was reported that DLC:SiO x films might contain (20 -47) at.% of hydrogen [7,21].…”
Section: Chemical Compositionmentioning
confidence: 99%
“…Due to the decreased stress there is no problem to deposit DLC:SiO x films thicker than 1 μm, while in the case of the DLC it is problematic. Synthesis of the DLN films of thickness of several microns [7,11,21,43] and even up to 10 μm [12] was reported.…”
Section: Residual Stress Hardness and Young's Modulusmentioning
confidence: 99%