2015
DOI: 10.1063/1.4937452
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Correlation between the spin Hall angle and the structural phases of early 5d transition metals

Abstract: We have studied the relationship between the structure and the spin Hall angle of the early 5d transition metals in X/CoFeB/MgO (X=Hf, Ta, W, Re) heterostructures. Spin Hall magnetoresistance (SMR) is used to characterize the spin Hall angle of the heavy metals.Transmission electron microscopy images show that all underlayers are amorphous-like when their thicknesses are small, however, crystalline phases emerge as the thickness is increased for certain elements. We find that the heavy metal layer thickness de… Show more

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Cited by 119 publications
(128 citation statements)
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“…The highly textured hcp phase appears beyond d N $6 nm for¯lms with and without the Ta seed layer. From transmission electron microscopy studies, 62 we alsō nd that the surface roughness of the Re underlayer is much larger than the other elements: this is likely to do with the poor wetting of Re on SiO 2 . It turns out that inserting the Ta seed layer can signi¯cantly improve the surface roughness, 62 thus improving values of M/V and K EFF at small d N .…”
Section: Perpendicular Magnetic Anisotropymentioning
confidence: 99%
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“…The highly textured hcp phase appears beyond d N $6 nm for¯lms with and without the Ta seed layer. From transmission electron microscopy studies, 62 we alsō nd that the surface roughness of the Re underlayer is much larger than the other elements: this is likely to do with the poor wetting of Re on SiO 2 . It turns out that inserting the Ta seed layer can signi¯cantly improve the surface roughness, 62 thus improving values of M/V and K EFF at small d N .…”
Section: Perpendicular Magnetic Anisotropymentioning
confidence: 99%
“…From transmission electron microscopy studies, 62 we alsō nd that the surface roughness of the Re underlayer is much larger than the other elements: this is likely to do with the poor wetting of Re on SiO 2 . It turns out that inserting the Ta seed layer can signi¯cantly improve the surface roughness, 62 thus improving values of M/V and K EFF at small d N . For the thick Re underlayer¯lms, the di®erence in M/V and K EFF between the¯lms with and without the Ta seed layer becomes negligible.…”
Section: Perpendicular Magnetic Anisotropymentioning
confidence: 99%
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“…To have a quantitative correlation of this thickness dependence to that of H DL , one needs to look into their expressions, respectively. Firstly, the SMR ratio can be expressed as 34 …”
Section: Phe Measurements Of Femn/pt Bilayersmentioning
confidence: 99%