a Large sheet resistance is the critical problem of graphene for application in the electronic and optoelectronic devices as transparent electrodes. Ultraviolet/Ozone (UVO) treatment is a convenient, highly effective, vacuum process and postclean free method. This paper reveals that the effect of UVO treatment on resistance of graphene is substrate dependent, which means that the band gap and photogenerated charge carriers of the substrates under UV irritation play a key role in the doping effect. The resistance of graphene can be decreased by as much as 80% on F8BT, GaN and PTFE substrates, by 70% on PMMA substrate, by 50% on paraffin and glass substrates. Large band gap substrate (> hν) will induce p-doping effect, while small band gap substrate (< hν) with plenty of photogenerated free charge carriers will induce n-doping effect. This approach will have great impact on practical application of graphene in electronic and optoelectronic device fabrication.