Correlation of Structure and Magnetic Properties of Thin CoP Films

Mirzamaani, M.; Romankiw, L. T.; McGrath, Colleen; Karasinski, J.; Mahlke, J.; Anderson, Nicholas C.

doi:10.1149/1.2095438

Cited by 30 publications

(13 citation statements)

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“…Therefore, the relationships among the magnetic properties, the plating variables, and the microstructures of the electroless Co-P film have been studied extensively. 4,[6][7][8][9][10][11][12] There is little literature about the growth kinetics of the electroless Co-P plating. Frieze et al studied the nucleation of electroless Co-P deposits on carbon film by electron microscopy.…”

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confidence: 99%

Growth Kinetics of Electroless Cobalt Deposition by TEM

Liu

Hsieh

Tsai

et al. 2004

J. Electrochem. Soc.

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The activation energy and initial growth of electroless cobalt thin films on silicon wafer has been studied by transmission electron microscopy ͑TEM͒. Electroless cobalt was deposited on Si͑001͒ substrates after preactivation treatment. The electroless cobalt deposited initially nucleated into particles with different sizes and shapes, which coalesced together sequentially, and finally became a continuous film. The incubation period of Co-P deposit decreased when plating temperature increased from 65 to 90°C. The plot of film thickness vs. plating time was used to determine the plating rates. The plating rates increased when plating temperature increased from 65 to 90°C. The activation energy for the initial deposition of electroless Co-P film was 15.67 kcal/mol, which was calculated according to the Arrhenius equation.

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confidence: 99%

Growth Kinetics of Electroless Cobalt Deposition by TEM

Liu

Hsieh

Tsai

et al. 2004

J. Electrochem. Soc.

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“…This is also evident with regard to their mechanical properties, such as hardness and indentation, and Young's modulus, respectively. With regard to hardness and elastic moduli, a dependence on the deposition temperature as well as the current density should be noted in particular, although this appears to have no influence on the homogeneity of the coatings [17,19]. In addition to these factors, the coating thickness, in particular, is of decisive importance, as it fundamentally influences not only the mechanical properties but also the magnetic properties of the coating [20].…”

Section: Further Planned Materials Characterizationsmentioning

confidence: 99%

Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System

Theis

Bill

Knoll³

et al. 2022

Metals

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The fabrication and design of hard magnetic materials for micro-electro-mechanical system applications by electrochemical deposition has to consider not only the intrinsic material properties but also the shape anisotropy of the micro-devices. Within the scope of the present work, an as-plated process for hard magnetic Co-based materials was developed, with the products intended to be used as magnetic scales in a positioning system with a resolution within the nanometer range. First, the process–material correlations are investigated in a laboratory-scale process. The CoP and CoNiP show a maximum coercivity of HC = 28 and 45 kA/m, respectively, as well as maximum remanence polarizations of JR = 0.65 and 0.40 T, respectively. The CoP process is transferred to a specially developed 20 L plating cell with paddle convection capabilities and a passive bezel to deposit 50 µm wide scales with different thicknesses of up to 55 µm in an integrated process. The in-plane magnetization of the scale bars shows higher remanence polarization than for the out-of-plane direction. Magnetic field-assisted electrochemical deposition promotes the vertical magnetization component resulting in a remanence polarization of 205 mT (out-of-plane) for a scale thickness of 25 µm.

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“…Например, с помощью изменения кислотности рабочих растворов можно создавать как высокоанизотропные, так и низкоанизотропные образцы, значительно отличающиеся величиной коэрцитивной силы H C [3]. Благодаря этому химически осажденные кобальтовые пленки обладают большим потенциалом практического использования, например, для создания магнитной памяти [4,5], а также различных управляющих или считывающих устройств [6,7]. Несмотря на то, что в настоящее время существует большое количество работ, посвященных влиянию кислотности раствора на структурные и магнитные свойства химически осажденных кобальтовых пленок [8][9][10][11], к настоящему времени отсутствуют сведения о модификациях кристаллической решетки кобальта в зависимости от размеров составляющих их кристаллитов.…”

Section: Introductionunclassified

Аллотропные Модификации Кобальта При Химическом Осаждении

Чжан¹,

Подорожняк²,

Мальцев³

et al. 2021

Физика Твердого Тела

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The effect of the acidity of solutions on the crystal structure of cobalt during its chemical precipitation is reported. On the basis of structural, magnetic studies, as well as studies by nuclear magnetic resonance, it was shown that a change in the acidity of the working solution leads to the precipitation of cobalt in various allotropic modifications in the immediate environment: by the type of hcp in the region of small (up to ~ 8.5) and by the type of fcc in the region large (over ~ 8.5) pH values. The formation of these modifications of cobalt is associated with size effects, which are caused by a decrease in the size of its particles with increasing pH.

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Correlation of Structure and Magnetic Properties of Thin CoP Films

Abstract: C-V HYSTERESIS INSTABILITY 2813deed important to the investigation of the radiation effect on tantalum oxide-based devices, and should be carefully considered when one is interpreting the interface charges from C-V curves.

Cited by 30 publications

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Growth Kinetics of Electroless Cobalt Deposition by TEM

Growth Kinetics of Electroless Cobalt Deposition by TEM

Electrochemical Deposition of CoP and CoNiP as Hard Magnetic Scales in a Position Measurement System

Аллотропные Модификации Кобальта При Химическом Осаждении

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