Correlation of the role of boron concentration on the microstructure and electrochemical properties of diamond electrodes

Chen, Yinghao; Gao, Xifeng; Liu, Guoshuai; Zhu, Ruitong; Yang, Wanlin; Li, Zhishen; Liu, Fangmu; Zhou, Kechao; Yu, Zhaoju; Wei, Qiuping; Ma, Li

doi:10.1080/26941112.2021.2017759

Cited by 11 publications

(4 citation statements)

References 33 publications

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“…Therefore, we conducted all subsequent experiments below 100 mA cm −2 . The amount of boron content (within a cubic centimetre) can roughly be estimated by an empirical relationship 47 (eqn (1)). [B] = 8.44 × 10 30 × exp(−0.048 × W ) (cm −3 ). W is the wavenumber corresponding to the peak of the Lorentzian component of the Raman spectra at 400–600 cm −1 .…”

Section: Resultsmentioning

confidence: 99%

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Electrochemical decarboxylation of acetic acid on boron-doped diamond and platinum-functionalised electrodes for pyrolysis-oil treatment

et al. 2023

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Electrochemical decarboxylation of acetic acid on boron-doped diamond and platinum-functionalised electrodes for pyrolysis-oil treatment

et al. 2023

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“…In addition to conventional standard methods, optical techniques, including fluorescence analysis [5], surface plasmon resonance [6,7], surface-enhanced Raman scattering [8,9], and electrochemical sensing, can selectively identify and sensitively detect microorganisms through the assistance of endogenous biomarkers such as antibodies/antigens, aptamers, DNA, etc. Among them, electrochemical biosensors have emerged as a promising candidate due to their fast response, ease of miniaturization, and cost-effectiveness [10][11][12]. Via incorporation with biomarkers, the electrochemical biosensors have achieved the sensitive detection of DNA [13], toxins [14], cancer cells [15], and bacteria [16].…”

Section: Introductionmentioning

confidence: 99%

Development and Application of an Electrochemical Sensor with 1,10-Phenanthroline-5,6-dione-Modified Electrode for the Detection of Escherichia coli in Water

et al. 2023

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The routine monitoring of bacterial populations is crucial for ensuring water quality and safeguarding public health. Thus, an electrochemical sensor based on a 1,10-phenanthroline-5,6-dione-modified electrode was developed and explored for the detection of E. coli. The modified electrode exhibited enhanced NADH oxidation ability at a low potential of 0.1 V, which effectively eliminated the interference from other redox compounds in bacteria. The sensitivity for NADH was 0.222 μA/μM, and the limit of detection was 0.0357 μM. Upon cell lysis, the intracellular NADH was released, and the concentration of E. coli was determined through establishing the relationship between the oxidation current signal and NADH concentration. The performance of the electrochemical sensor in the detection of NADH and E. coli suspensions was validated using the WST-8 colorimetric method. The blank recovery experiment in real water samples exhibited good accuracy, with recovery rates ranging from 89.12% to 93.26% and relative standard deviations of less than 10%. The proposed electrochemical sensor realized the detection of E. coli without the usage of biomarkers, which provides a promising approach for the broad-spectrum detection of microbial contents in complex water environments.

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“…Boron finds its major use in reinforcement and insulation of industrial fiber plastics, metal alloys and ceramics. Moreover, boron has applications in the semiconductor industry, where it is utilized for implantation and solid state diffusion by thermal processing and allows for the functionalization of materials and realization of alloys to enhance electrical [1][2][3][4][5][6][7][8], chemical [9][10][11][12][13][14][15][16][17] and optical properties [18][19][20][21][22]. The specific deposition techniques applied in the semiconductor industry are physical vapor deposition (PVD), such as evaporation and sputtering, and chemical vapor deposition (CVD).…”

Section: Introductionmentioning

confidence: 99%

Synthesis and Characterization of Boron Thin Films Using Chemical and Physical Vapor Depositions

et al. 2022

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Boron as thin film material is of relevance for use in modern micro- and nano-fabrication technology. In this research boron thin films are realized by a number of physical and chemical deposition methods, including magnetron sputtering, electron-beam evaporation, plasma enhanced chemical vapor deposition (CVD), thermal/non-plasma CVD, remote plasma CVD and atmospheric pressure CVD. Various physical, mechanical and chemical characteristics of these boron thin films are investigated, i.e., deposition rate, uniformity, roughness, stress, composition, defectivity and chemical resistance. Boron films realized by plasma enhanced chemical vapor deposition (PECVD) are found to be inert for conventional wet chemical etchants and have the lowest amount of defects, which makes this the best candidate to be integrated into the micro-fabrication processes. By varying the deposition parameters in the PECVD process, the influences of plasma power, pressure and precursor inflow on the deposition rate and intrinsic stress are further explored. Utilization of PECVD boron films as hard mask for wet etching is demonstrated by means of patterning followed by selective structuring of the silicon substrate, which shows that PECVD boron thin films can be successfully applied for micro-fabrication.

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Correlation of the role of boron concentration on the microstructure and electrochemical properties of diamond electrodes

Cited by 11 publications

References 33 publications

Electrochemical decarboxylation of acetic acid on boron-doped diamond and platinum-functionalised electrodes for pyrolysis-oil treatment

Electrochemical decarboxylation of acetic acid on boron-doped diamond and platinum-functionalised electrodes for pyrolysis-oil treatment

Development and Application of an Electrochemical Sensor with 1,10-Phenanthroline-5,6-dione-Modified Electrode for the Detection of Escherichia coli in Water

Synthesis and Characterization of Boron Thin Films Using Chemical and Physical Vapor Depositions

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