Corrosion inhibition and friction-reduction property of tetrazole derivatives on copper

Liu, Lin; Su, Hongyu; Xing, Jinjuan; Peng, Dan; Zhang, Qiang; Qian, Jianhua

doi:10.1108/acmm-09-2017-1839

Cited by 7 publications

(5 citation statements)

References 21 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Compared to the other two surfactants, AEO-9 resulted in a lower contact angle. This was beneficial for bonding between the polishing solution and the wafer surface, as The contact angle was a crucial indicator of the liquid's wettability on the solid surface [27]. To elucidate the impact of three surfactants with distinct structures on the surface quality of silicon wafers after CMP, we measured the contact angle of polishing liquids containing these surfactants on the surface of single-crystal silicon wafers.…”

Section: The Effect Of Surfactants With Different Functional Groups O...mentioning

confidence: 99%

Effect of Polyoxyethylene-Based Nonionic Surfactants on Chemical–Mechanical Polishing Performance of Monocrystalline Silicon Wafers

Jiang,

Guan,

Zhao

et al. 2024

Crystals

View full text Add to dashboard Cite

The use of surfactants is crucial in the chemical–mechanical polishing fluid system for silicon wafers. This paper examines the impact of the functional group structure of polyoxyethylene-based nonionic surfactants and the variation in the polyoxyethylene (EO) addition number on the polishing performance of monocrystalline silicon wafers, to achieve the appropriate material removal rate and surface quality. The results demonstrated that the straight-chain structure of fatty alcohol polyoxyethylene ether (AEO-9) exhibited superior performance in wafer polishing compared to octylphenol polyoxyethylene ether (OP-9) and isoprenol polyoxyethylene ether (TPEG) and polyethylene glycol (PEG). By varying the number of EO additions of AEO-type surfactants, this study demonstrated that the polishing performance of monocrystalline silicon wafers was affected by the number of EO additions. The best polishing effect was achieved when the number of EO additions was nine. The mechanism of the role of polyoxyethylene-type nonionic surfactants in silicon wafer polishing was derived through polishing experiments, the contact angle, abrasive particle size analysis, zeta potential measurement, XPS, and other means of characterization.

show abstract

Section: The Effect Of Surfactants With Different Functional Groups O...mentioning

confidence: 99%

Effect of Polyoxyethylene-Based Nonionic Surfactants on Chemical–Mechanical Polishing Performance of Monocrystalline Silicon Wafers

Jiang,

Guan,

Zhao

et al. 2024

Crystals

View full text Add to dashboard Cite

show abstract

“…Electrochemical measurements [18,19] were carried out in a conventional three-electrode cell on Parstat 2273 Electrochemistry Work Station (Princeton, USA). And the cell assembly consistes of Q235 steel as working electrode (sealed with epoxy resin, the working area was 1 cm 2 ), the auxiliary electrode was the platinum electrode, and the saturated calomel electrode (SCE) was the reference electrode with a Luggin capillary bridge.…”

Section: Electrochemical Measurementmentioning

confidence: 99%

“…In cooperative adsorption, the anion is chemisorbed on the metal surface and the cation is adsorbed on a layer of the anion and vice versa. Both competitive and co-operative mechanisms may occur simultaneously [18,21]. The synergistic inhibition effect of SSA with IAS may be related to the presence of polar functional group (-OH) in SSA, which more tightly bound to IAS.…”

Section: Corrosion Inhibition Performance Of Additives 321 Weight-los...mentioning

confidence: 99%

The synergistic inhibition effects of oleic imidazoline quaternary ammonium salt and sulfonate on Q235 steel corrosion in HCl media

He¹,

Xiong²,

Zhang³

et al. 2019

Surf. Topogr.: Metrol. Prop.

View full text Add to dashboard Cite

In order to solve the corrosion problem of Q235 steel in acidic medium, an inactive surfur-containing sulfonate derivatives (SSA) and oleic imidazoline quaternary ammonium salt (IAS) have been synthesized and characterized. Their inhibitive effect with sodium sulfonate (T702) on Q235 steel in 1.0 M HCl solution was investigated by using chemical method (weight-loss) and electrochemical impedance spectrum (EIS), potentiodynamic polarization, scanning electron microscope (SEM) and x-ray photoelectron spectrometer (XPS). All results showed that SSA, T702 and IAS had a good corrosion inhibition effect for Q235 steel, and the effect of all complex agents was superior to the single agent. The synergism parameter suggested that the best synergistic effect was remarkable at concentrations of 50 mg•L −1 IAS and 100 mg•L −1 sulfate, and the better effect of SSA with IAS was more than T702 with IAS, because of the higher polarity of SSA compared to T702. There was a cooperative mechanism between the sulfate and IAS. These inhibitors were ionic-type inhibitors, the formation of a protective layer on the Q235 steel surface was induced by the adsorption of inhibitor molecules. The SEM and XPS analysis results also confirmed the existence of the protective layer, which contained nitrogen and/or sulfur compounds on the Q235 steel surface.

show abstract

“…Due to their exciting properties, tetrazoles have been used in various applications such as explosive and propellant materials, medicinal chemistry, solar cells, , agriculture, , and anti-corrosion compounds. − …”

Section: Introductionmentioning

confidence: 99%

DFT Study on Corrosion Inhibition by Tetrazole Derivatives: Investigation of the Substitution Effect

Khabazi

Chermahini

2023

ACS Omega

View full text Add to dashboard Cite

Corrosion is one of the problems that most industries face. Our aim in the current study is to perform density functional theory calculations and Monte Carlo simulation to theoretically investigate the corrosion inhibition of the copper (1 1 1) surface by tetrazole molecules and a group of their derivatives. These compounds have electron-donating groups (CH3, CH3O, and OH) and electron-withdrawing groups (F, CN, and NO2). Two different isomeric forms of tetrazole molecules and their derivatives, including 1H and 2H tautomers, were studied in two configurations, parallel and perpendicular to the Cu (1 1 1) surface. With the help of DMol3 calculations, the most important parameters related to the molecular ability of tetrazole derivatives as corrosion inhibitors include the adsorption energy (ΔE), E HOMO, E LUMO, E gap, and issues related to chemical reactions, including total hardness (η), electronegativity (χ), and electron fraction transitions from the anti-corrosion molecule to the copper atom (ΔN), were calculated and compared in the tetrazole molecules and their derivatives. Also, with the help of adsorption locator calculations, the inhibitory effects of these compounds were theoretically investigated in an acidic environment. Through these calculations, it was determined that tetrazole molecules with electron-donating groups adsorbed perpendicularly to the copper (1 1 1) surface, by forming a stronger bond, are considered suitable corrosion inhibitors. Also, among the examined molecules, the 2H-tetrazole isomer form plays a more influential role than the 1H-tetrazole form.

show abstract

Corrosion inhibition and friction-reduction property of tetrazole derivatives on copper

Cited by 7 publications

References 21 publications

Effect of Polyoxyethylene-Based Nonionic Surfactants on Chemical–Mechanical Polishing Performance of Monocrystalline Silicon Wafers

Effect of Polyoxyethylene-Based Nonionic Surfactants on Chemical–Mechanical Polishing Performance of Monocrystalline Silicon Wafers

The synergistic inhibition effects of oleic imidazoline quaternary ammonium salt and sulfonate on Q235 steel corrosion in HCl media

DFT Study on Corrosion Inhibition by Tetrazole Derivatives: Investigation of the Substitution Effect

Contact Info

Product

Resources

About