Corrosion of sputtered titanium nitride films deposited on iron and stainless steel

Massiani, Y.; Medjahed, Aïcha; Crousier, J.; Gravier, P.; Rebatel, I.

doi:10.1016/0257-8972(91)90213-g

Cited by 50 publications

(10 citation statements)

References 9 publications

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“…Corrosion studies on PVD ceramic coatings typically show favorable results for all organic solvents, most acids, bases, and in hydrothermal conditions [437][438][439][440][441][442][443][444]. Because the coatings possess amorphous or columnar grain structures and are deposited epitaxially from high purity targets, they are devoid of impurities, which favors improved corrosive behavior.…”

Section: Chemical Corrosionmentioning

confidence: 97%

Ceramics and ceramic coatings in orthopaedics

McEntire

Bal

Rahaman

et al. 2015

Journal of the European Ceramic Society

188

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Section: Chemical Corrosionmentioning

confidence: 97%

Ceramics and ceramic coatings in orthopaedics

McEntire

Bal

Rahaman

et al. 2015

Journal of the European Ceramic Society

188

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“…Consequently, the coating parlays the charge transfer resistance to counteract the corrosion reaction. 28 For instance, high corrosion resistance of laser ablated TiO 2 coatings on steel has been reported. 24 In comparison, AlN films fabricated by nitrogen plasma implantation into aluminum can provide a much higher charge transfer resistance.…”

Section: Discussionmentioning

confidence: 99%

Effects of bias voltage on the corrosion resistance of titanium nitride thin films fabricated by dynamic plasma immersion ion implantation-deposition

Xia

Chu

2002

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Articles you may be interested inOrganic polymer thin films deposited on silicon and copper by plasma-enhanced chemical vapor deposition method and characterization of their electrochemical and optical properties J. Vac. Sci. Technol. A 23, 875 (2005); 10.1116/1.1946714 Effects of plasma excitation power, sample bias, and duty cycle on the structure and surface properties of amorphous carbon thin films fabricated on AISI440 steel by plasma immersion ion implantation Development of an energetic ion assisted mixing and deposition process for TiN x and diamondlike carbon films, using a co-axial geometry in plasma source ion implantation Dynamic plasma-based thin-film deposition incorporating ion mixing and plasma immersion is an effective technique to synthesize nitride-based hard films. We have fabricated TiN films using a filtered titanium vacuum arc in a nitrogen plasma environment. A pulsed high voltage is applied to the target for a short time when the metallic arc is fired to attain simultaneous plasma deposition and ion mixing. We investigate the dependence of the corrosion resistance and interfacial structure of the treated samples on the applied voltage. Our Auger results reveal an oxygen-rich surface film due to the non-ultra-high-vacuum conditions and high affinity of oxygen to titanium. The corrosion current is reduced by two orders of magnitude comparing the sample processed at 8 kV to the untreated sample, but the 23 kV sample unexpectedly shows worse results. The pitting potential diminishes substantially although the corrosion current is similar to that observed in the 8 kV sample. The polarization test data are consistent with our scanning electron microscopy observation, corroborating the difference in the pitting distribution and appearance. This anomalous behavior is believed to be due to the change in the chemical composition as a result of high-energy ion bombardment.

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“…But as orthodontic material, corrosion resistance is also a very important property. There are so many studies on the corrosion resistance of TiN coating [11][12][13][14]. Coating TiN on NiTi alloy can significantly improve the corrosion resistance in H 2 SO 4 and HCl [15,16].…”

Section: Introductionmentioning

confidence: 99%