Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass

Däschner, Walter; Long, Pin; Stein, R.; Wu, Chuck; Lee, S. H.

doi:10.1364/ao.36.004675

Cited by 100 publications

(50 citation statements)

References 11 publications

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“…Micro three-dimensional structures have been fabricated by a layer-by-layer process [1], a UV-LIGA process [2] [3], moving mask UV lithography [4], and gray-scale lithography [5]. Another fabrication method has been proposed that utilizes chemically amplified epoxybased negative resist(SU-8 etc.)…”

Section: Exposure Systemmentioning

confidence: 99%

High Aspect Ratio Sloping and Curved Structures Fabricated by Proximity and UV-LED Backside Exposure

Matsumoto¹

2010

Lithography

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Section: Exposure Systemmentioning

confidence: 99%

High Aspect Ratio Sloping and Curved Structures Fabricated by Proximity and UV-LED Backside Exposure

Matsumoto¹

2010

Lithography

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“…Gray-scale lithography has been proven to be a suitable technology for the fabrication of arbitrary three-dimensional surface profiles [10]- [12]. This technology uses the high energy beam sensitive (HEBS) (Canyon Materials, Inc.) as a real grayscale mask in conventional photolithographic contact printing.…”

Section: A Gray-scale Lithographymentioning

confidence: 99%

Efficient Planar-Integrated Free-Space Optical Interconnects Fabricated by a Combination of Binary and Analog Lithography

Heming

Wittig

Dannberg

et al. 2008

J. Lightwave Technol.

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Abstract-Design, fabrication, and experimental testing of an integrated microoptical module for interconnection are reported. The systems integration is based on the concept of planar-integrated free-space optics. The module combines diffractive-reflective and refractive microoptics. The diffractive elements were fabricated by binary lithography and reactive ion etching. The refractive elements were made by analog lithography using a high-energy beam sensitive mask and replication in Ormocer. The fabricated module implemented a simple one-dimensional optical interconnect. Two versions were implemented for which insertion losses of approximately 8 and 4.5 dB were measured, respectively.

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“…55,56,57 A collinear-beam design that might improve upon the one illustrated in Figure 3 Gray-scale manufacturing techniques have reduced higher-order diffraction of light for Fresnel lenses, or HOEs; and high-efficiency, dual-focus lenses are now available. 58 In addition to the two-beam lens, an HOE Fourier transform lens might be designed to minimize the power lost to higher-order diffraction due to the multiple Bragg-cell channels. Historically, the analysis of multi-channel, Bragg-cell beam forming processors has been for radar signal processing or beam finding.…”

Section: Collinear-beam Architecturementioning

confidence: 99%

The Role of Adaptive Photorefractive Power Limiting on Acousto-Optic Radio Frequency (RF) Signal Excision

Stevens¹

2001

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The public reporting burden for this collection of information is estimated to average 1 hour per response, including the time for reviewing instructions, searching existing data sources, searching existing data sources, gathering and maintaining the data needed, and completing and reviewing the collection of information. Send comments regarding this burden estimate or any other aspect of this collection of information, including suggestions for reducing this burden, to Department of Defense, Washington Headquarters Services, Directorate for Information , 1215 Jefferson Davis Highway, Suite 1204, Arlington, VA 22202-4302. Respondents should be aware that notwithsta nding any other provision of law, no person shall be subject to any penalty for failing to comply with a collection of information if it does not display a currently valid OMB control number. PLEASE DO NOT RETURN YOUR FORM TO THE ABOVE ADDRESS. REPORT DATE (DD-MM-YY)2. REPORT TYPE 3. DATES COVERED (From -To) SPONSORING/MONITORING AGENCY ACRONYM(S)AFRL/SNDI SPONSORING/MONITORING AGENCY NAME(S) AND ADDRESS(ES)Sensors Directorate Air Force Research Laboratory Air Force Materiel Command Wright-Patterson Air Force Base, OH 45433-7318 SPONSORING/MONITORING AGENCY REPORT NUMBER(S) AFRL-SN-WP-TR-2002-1131 DISTRIBUTION/AVAILABILITY STATEMENTApproved for public release; distribution is unlimited. SUPPLEMENTARY NOTESThis material is declared a work of the U. S. Government and is not subject to copyright protection in the United States. Report contains color. ABSTRACT (Maximum 200 Words)Acousto-optic RF signal excision techniques offer real-time, narrowband RF interference, frequency-domain filtering for broadband commu nication systems, but has been limited in its capability for adaptive processing and rejection of broadband RF interference. As a means to reduce these limitations, this effort examines the application of a novel photorefractive optical power limiting device to achieve adaptive notch filtering, and multi-channel acousto-optic deflection to achieve angle-of-arrival signal discrimination at the notch filter. This report describes basic principles of acousto-optic RF signal excision, including linear phased-array antenna, angle-of-arrival processing using a multi-channel acousto-optic deflector. The principles are verified experimentally by demonstration of frequency-domain filtering according to frequency and angle of arrival. This report also describes basic principles of photorefractive optical power limiting and gives a numerical solution of the band-transport model, and experimental measurement of notch-filter amplitude and spatial profiles for high-intensity and terminate at the dark-to-light illumination interface where excess charge accumulates. The results show that space and time excision of interference may be achieved, but the adaptive notch-filter width developed by high-intensity RF interference can overwhelm the angle-of-arrival resolution when small antenna arrays are used. SUBJECT TERMSFourier optics, optical signal processing, spat...

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Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive glass

Cited by 100 publications

References 11 publications

High Aspect Ratio Sloping and Curved Structures Fabricated by Proximity and UV-LED Backside Exposure

High Aspect Ratio Sloping and Curved Structures Fabricated by Proximity and UV-LED Backside Exposure

Efficient Planar-Integrated Free-Space Optical Interconnects Fabricated by a Combination of Binary and Analog Lithography

The Role of Adaptive Photorefractive Power Limiting on Acousto-Optic Radio Frequency (RF) Signal Excision

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