2012
DOI: 10.1063/1.4737650
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Critical influence of target-to-substrate distance on conductive properties of LaGaO3/SrTiO3 interfaces deposited at 10−1 mbar oxygen pressure

Abstract: We investigate pulsed laser deposition of LaGaO 3 /SrTiO 3 at 10 -1 mbar oxygen background pressure, demonstrating the critical effect of the target-to-substrate distance, d TS , on the interface sheet resistance, R s . The interface turns from insulating to metallic by progressively decreasing d TS . The analysis of the LaGaO 3 plume evidences the important role of the plume propagation dynamics on the interface properties. These results demonstrate the growth of conducting interfaces at an oxygen pressure of… Show more

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Cited by 24 publications
(19 citation statements)
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(73 reference statements)
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“…The growth conditions (730 °C and 1 × 10 −2 mbar oxygen pressure) and the slow cooling of samples (in the same atmosphere as the growth) were chosen to minimize the formation of oxygen vacancies3435, and the Ga desorption. The oscillating intensity of the reflected high-energy electron diffraction (RHEED) pattern, recorded during the growth, allowed to control the overlayers thicknesses and to check the final surface and structural quality.…”
Section: Methodsmentioning
confidence: 99%
“…The growth conditions (730 °C and 1 × 10 −2 mbar oxygen pressure) and the slow cooling of samples (in the same atmosphere as the growth) were chosen to minimize the formation of oxygen vacancies3435, and the Ga desorption. The oscillating intensity of the reflected high-energy electron diffraction (RHEED) pattern, recorded during the growth, allowed to control the overlayers thicknesses and to check the final surface and structural quality.…”
Section: Methodsmentioning
confidence: 99%
“…Usually, with few exceptions [40], high oxygen pressures (> 10 -3 mbar) produce insulating or barely conducting films, possibly related to a La/Al cation ratio close or larger than 1.…”
Section: The Growth Of Laalo 3 /Srtio 3 Interfacesmentioning
confidence: 99%
“…The first 4-5 oscillations are ill defined, particularly in the t ¼ 32 ML film, but subsequent oscillations present high amplitude. The reduction of amplitude in the first oscillations, usually observed in RHEED monitoring of heteroepitaxial growth, 5,14 is likely due to interference between electrons reflected at the film surface and at the film-substrate interface. When increasing further the thickness the oscillations become clear, indicating that YSZ grows by layer-by-layer two-dimensional mechanism on the STO(110) substrate.…”
mentioning
confidence: 99%