High-quality heteroepitaxial
two-dimensional (2D) InSb layers are
very difficult to realize because of the large lattice mismatch with
other widespread semiconductor substrates. A way around this problem
is to grow free-standing 2D InSb nanostructures on nanowire (NW) stems,
thanks to the capability of NWs to efficiently relax elastic strain
along the sidewalls when lattice-mismatched semiconductor systems
are integrated. In this work, we optimize the morphology of free-standing
2D InSb nanoflags (NFs). In particular, robust NW stems, optimized
growth parameters, and the use of reflection high-energy electron
diffraction (RHEED) to precisely orient the substrate for preferential
growth are implemented to increase the lateral size of the 2D InSb
NFs. Transmission electron microscopy (TEM) analysis of these NFs
reveals defect-free zinc blend crystal structure, stoichiometric composition,
and relaxed lattice parameters. The resulting NFs are large enough
to fabricate Hall-bar contacts with suitable length-to-width ratio
enabling precise electrical characterization. An electron mobility
of ∼29 500 cm
2
/(V s) is measured, which is
the highest value reported for free-standing 2D InSb nanostructures
in literature. We envision the use of 2D InSb NFs for fabrication
of advanced quantum devices.