2013
DOI: 10.13188/2474-1914.1000001
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Cryo-SiN – An Alternative Substrate to Visualize Active Viral Assemblies

Abstract: Silicon nitride (SiN) membranes that are merely nanometers-thick have been introduced as new support films for electron microscopy (EM) applications. The use of these thin membranes for high-resolution imaging is widely attractive due to their consistent manufacture, flatness, and durability. Here, we utilized SiN support films to actively monitor key steps in rotavirus RNA synthesis at the nanoscale. Rotaviruses are gastrointestinal pathogens that infect pediatric populations and pose a major health problem i… Show more

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“…Thin films, such as Kapton and especially Ultralene, offer high signal transmission, purity, and are frequently used as experimental surfaces for X-ray studies. For cryo-X-ray fluorescence microscopy, the frame of the silicon nitride window acts as a thermal conducting surface that can support the low temperatures for a frozen specimen, , with the additional benefit of its nitride membrane being an X-ray transparent, nonmetal support to avoid conflicting with the elemental detection of metals within the sample, , which would be an issue for TEM grids. Prior to testing, the silicon nitride windows were cleaned with oxygen plasma, with a mask placed over the central portion of the window where the supporting silicon was etched away.…”
Section: Methodsmentioning
confidence: 99%
“…Thin films, such as Kapton and especially Ultralene, offer high signal transmission, purity, and are frequently used as experimental surfaces for X-ray studies. For cryo-X-ray fluorescence microscopy, the frame of the silicon nitride window acts as a thermal conducting surface that can support the low temperatures for a frozen specimen, , with the additional benefit of its nitride membrane being an X-ray transparent, nonmetal support to avoid conflicting with the elemental detection of metals within the sample, , which would be an issue for TEM grids. Prior to testing, the silicon nitride windows were cleaned with oxygen plasma, with a mask placed over the central portion of the window where the supporting silicon was etched away.…”
Section: Methodsmentioning
confidence: 99%