Crystal Al-Doped ZnO Thin-Film Preparation by Sputtering Deposition using a Mixed-Powder Target

Abstract

Al-doped ZnO films were prepared by sputtering deposition using mixtures of Al2O3 and ZnO powder targets. The film quality depended on the conditions of the target powder. The deposition rate, crystallinity, and transparency of films prepared with new, pressed powder targets were higher than those prepared with used, nonpressed powder targets. In addition, we found that pressurizing the new-powder target and increasing the substrate temperature resulted in thin films with high transparency and electrical conductivity