The development of a surface micromachined infrared ray (IR) focal plane array (FPA), in which a single SiO 2 layer functions as an IR absorbing plate and a Pb(Zr 0.3 Ti 0.7 )O 3 thin film serves as a thermally sensitive material is described. The advantages of using SiO 2 as an IR absorbing layer include the fact that it has good IR absorbance within the 8-12 µm spectral range. In this case, about 60% of the incident IR spectrum in this range was absorbed. Another important advantage of SiO 2 , when applied to the top of the Pt/PZT/Pt stack, is that it functions as a supporting membrane. Consequently, the IR absorbing layer forms as one body on the membrane structure, which simplifies the overall MEMS process and provides a robust structure.