thin film, which yielded a smoother surface and even a terraceand-step-like morphology on the substrate, resulting in improved crystallinity of the epitaxial film. Accordingly, both the dark and photo currents of β-Ga 2 O 3 metal-semiconductor-metal (MSM) PDs were increased by the enhanced carrier mobility (μ) of the more crystalline film. However, the substrate-annealing temperature must be sufficiently high to offset the rise of the dark current and thus achieve a remarkable improvement in the photodetection properties. As a result, the PD fabricated on the 1050 °C-annealed substrate exhibited extremely high sensitivity, for example, high responsivity (R) of 54.9 A/W and large specific detectivity (D*) of 3.71 × 10 14 Jones. Both parameters were increased by one order of magnitude because of the combined effects of the dramatic increase in μ and the effective reduction in defect-related recombination centers. Nevertheless, the latter also prolonged the recovery time of the PD. These findings suggest another way to develop β-Ga 2 O 3 PD with extremely high sensitivity.