2012
DOI: 10.1016/j.jcrysgro.2012.04.006
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Crystal orientation of β-Ga2O3 thin films formed on c-plane and a-plane sapphire substrate

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Cited by 178 publications
(129 citation statements)
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“…However, the substrate-annealing temperature must be sufficiently high that improvements in photodetection properties outweight the negative impact of the I dark increase. As a result, PD-1050 presented extremely high sensitivity: high responsivity of 54.9 A/W and large D* of 3.71 × 10 14 Jones. Both parameters were increased by one order of magnitude compared with those of PD-0.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…However, the substrate-annealing temperature must be sufficiently high that improvements in photodetection properties outweight the negative impact of the I dark increase. As a result, PD-1050 presented extremely high sensitivity: high responsivity of 54.9 A/W and large D* of 3.71 × 10 14 Jones. Both parameters were increased by one order of magnitude compared with those of PD-0.…”
Section: Discussionmentioning
confidence: 99%
“…Accordingly, researchers have attempted improve the crystalline quality of β-Ga 2 O 3 thin films. For example, the c-plane (0001) of sapphire substrates are often adopted for the epitaxial growth of β-Ga 2 O 3 thin films due to the high similarity in the oxygen-atom arrangement between the β-Ga 2 O 3 ( 2 01) plane and the sapphire c-plane [14]. Moreover, process conditions, for example, substrate temperature, oxygen pressure, and post-deposition annealing, have to be carefully optimized [15].…”
Section: Introductionmentioning
confidence: 99%
“…The substrate temperature was kept at 800 • C and the radio frequency power for the oxygen plasma was 100 W. The method for the formation of ␤-Ga 2 O 3 layer has been described in reference [10].…”
Section: Preparation Of ˇ-Ga 2 O 3 Thin Filmsmentioning
confidence: 99%
“…There are many different methods used to synthesize β-Ga 2 O 3 films such as sputtering [9,10], thermal evaporation [11,12], pulsed laser deposition (PLD) [13,14], molecular beam epitaxy (MBE) [3,15] and metal-organic chemical vapor deposition (MOCVD) [16]. The doping of β-Ga 2 O 3 films with different dopants such as Si [17] and Cu [18] has also been reported.…”
Section: Introductionmentioning
confidence: 99%