2023
DOI: 10.1002/masy.202100356
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Crystallinity Study of Cu Thin Film Deposited by Indigenously Developed DC Magnetron Sputtering Setup

Abstract: The copper thin films have a huge application in the field of material science research and they also act as a catalytic substrate which helps to deposit various carbon‐based polymers that can be used for sensors. There are several thin film development techniques available in the industries out of which magnetron sputtering technique shows some remarkable properties essential for depositing metal thin film efficiently. The main objective of this work is to develop copper thin films utilizing an indigenously d… Show more

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Cited by 5 publications
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“…where 𝜇 = 4𝜋 × 10 . The Cu coatings with different thicknesses on graphite surface were deposited by ion plating technology; the details can be seen in [34,35]. The thickness uniformity of the Cu coatings is examined using a JSM-7800F scanning electron microscope (JEOL Ltd., Tokyo, Japan) to minimize the influence of uneven coating thickness on RF conductivity results.…”
Section: 𝑄 =mentioning
confidence: 99%
“…where 𝜇 = 4𝜋 × 10 . The Cu coatings with different thicknesses on graphite surface were deposited by ion plating technology; the details can be seen in [34,35]. The thickness uniformity of the Cu coatings is examined using a JSM-7800F scanning electron microscope (JEOL Ltd., Tokyo, Japan) to minimize the influence of uneven coating thickness on RF conductivity results.…”
Section: 𝑄 =mentioning
confidence: 99%