1991
DOI: 10.1016/0022-0248(91)90077-i
|View full text |Cite
|
Sign up to set email alerts
|

Crystallographic tilting of heteroepitaxial layers

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

3
68
0
1

Year Published

1993
1993
2019
2019

Publication Types

Select...
5
3
2

Relationship

0
10

Authors

Journals

citations
Cited by 196 publications
(72 citation statements)
references
References 20 publications
3
68
0
1
Order By: Relevance
“…Research on tilt relaxation for strained layers on off-cut growth surfaces has been reported by a number of authors. 15,16 Assuming a pre-existing network of threading dislocations in the epitaxial layer, glide-limited tilt relaxation models have been developed to predict the amount of tilt relaxation that will occur in a mismatched off-cut film. Tilt relaxation on off-cut surfaces has been predicted to be maximized for growth conditions that maximize dislocation glide along the available asymmetric slip systems, namely high growth temperatures and small relative mismatch strains.…”
Section: Resultsmentioning
confidence: 99%
“…Research on tilt relaxation for strained layers on off-cut growth surfaces has been reported by a number of authors. 15,16 Assuming a pre-existing network of threading dislocations in the epitaxial layer, glide-limited tilt relaxation models have been developed to predict the amount of tilt relaxation that will occur in a mismatched off-cut film. Tilt relaxation on off-cut surfaces has been predicted to be maximized for growth conditions that maximize dislocation glide along the available asymmetric slip systems, namely high growth temperatures and small relative mismatch strains.…”
Section: Resultsmentioning
confidence: 99%
“…In the previous section the first and second InP 1-y As y buffers were found to be nearly fully relaxed due to the efficient relief of the relative misfit strains of ∆ε misfit = +0.54% and +0.33% in these layers. As discussed in reference [13], layer tilt in non- FWHM 400 with respect to the group III and group V crystalline faces suggests that there is in fact an anisotropy in the overall densities/distibutions of α and β type dislocations which influences the crystalline structure in the active TPV layer. Open circuit voltage degradation in crystalline photovoltaic materials often results from a reduction in minority carrier lifetime due to the presence of electrically active crystalline defects.…”
Section: Reciprocal Space Mapping (Rsm)mentioning
confidence: 91%
“…where the film/substrate interface shows a low defect density, and only if competing mechanisms, such as misfit dislocations with inclined Burgers vectors, 7 do not dominate. Quantitative verification of the Nagai model has therefore remained elusive in oxide heteroepitaxy except for very thin films having a lattice parameter similar to that of the substrate (for example, 8 15 nm of SrRuO 3 on 4-miscut SrTiO 3 , resulting in a tilt of ~0.06).…”
Section: Main Textmentioning
confidence: 99%