Cu2O–ZnO heterojunction solar cell coupled to a Ni(OH)2-rGO-PPy supercapacitor within a porous stoneware tile

Orozco-Messana, Javier; Daly, Ronan; Zanchetta-Chittka, I.F.

doi:10.1016/j.ceramint.2020.06.229

Cited by 8 publications

(2 citation statements)

References 18 publications

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“…One key advantage is their exceptional chemical and mechanical stability, especially in environments involving hydrogen plasma. This makes ZnO thin films suitable for use in harsh conditions where other materials may deteriorate [6][7][8]. It is employed in variety of applications, like UV light emitters [9], piezoelectric transducers [10] and gas sensors [11].…”

Section: Introductionmentioning

confidence: 99%

Investigation physical properties of sprayed Cr doped ZnO thin ﬁlms

Saleh,

Dawood,

Chiad

et al. 2023

JOR

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ZnO and ZnO:Cr films were grown by the chemical spray deposition (CSD). The effect of the Cr content on ZnO was studied. All ZnO films show polycrystalline, hexagonal wurtzite structure, with (002) dominant plane. AFM displayed that films have a compact surface, its root mean square roughness increased with Cr percentage. The average diameter was smaller than 64 nm. The optical bandgap was evaluated using Transmittance data. Their values were found to be decreases via increment in Cr doping.

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Section: Introductionmentioning

confidence: 99%

Investigation physical properties of sprayed Cr doped ZnO thin ﬁlms

Saleh,

Dawood,

Chiad

et al. 2023

JOR

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“…Photosensitive metal-oxide semiconductors with different energy band gaps (Eg) have been studied for many applications, including solar cells [ 1 , 2 ], photodetectors [ 3 , 4 ], photocatalysts [ 5 , 6 ], water splitting [ 7 , 8 ] and photoelectrochemistry (PEC) [ 9 , 10 ]. In general, extra carriers can be generated based on the absorption of photons with an energy higher than the band gap of a semiconductor (e.g., hν ≥ Eg) [ 11 ].…”

Section: Introductionmentioning

confidence: 99%

Nanohollow Titanium Oxide Structures on Ti/FTO Glass Formed by Step-Bias Anodic Oxidation for Photoelectrochemical Enhancement

Huang

Pan

et al. 2022

Nanomaterials

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In this study, a new anodic oxidation with a step-bias increment is proposed to evaluate oxidized titanium (Ti) nanostructures on transparent fluorine-doped tin oxide (FTO) on glass. The optimal Ti thickness was determined to be 130 nm. Compared to the use of a conventional constant bias of 25 V, a bias ranging from 5 V to 20 V with a step size of 5 V for 3 min per period can be used to prepare a titanium oxide (TiOx) layer with nanohollows that shows a large increase in current of 142% under UV illumination provided by a 365 nm LED at a power of 83 mW. Based on AFM and SEM, the TiOx grains formed in the step-bias anodic oxidation were found to lead to nanohollow generation. Results obtained from EDS mapping, HR-TEM and XPS all verified the TiOx composition and supported nanohollow formation. The nanohollows formed in a thin TiOx layer can lead to a high surface roughness and photon absorbance for photocurrent generation. With this step-bias anodic oxidation methodology, TiOx with nanohollows can be obtained easily without any extra cost for realizing a high current under photoelectrochemical measurements that shows potential for electrochemical-based sensing applications.

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