2013
DOI: 10.1007/978-1-4614-8169-0_15
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Cubic GaN on Nanopatterned 3C-SiC/Si (001) Substrates

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Cited by 8 publications
(8 citation statements)
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“…26,34 It is comparable to but slightly lower than the peak energy of the planar and patterned c-GaN grown on SiC ranging 3.200−3.222 eV. 35 More red shift of the PL peak can imply higher tensile stress, 12,26 and the c-GaN of this work could be then in the stress greater than that on SiC in PL and indirectly confirms the tensile stress observed in XRD. Ultimately, the anisotropic stress of the c-GaN confined in a 1D groove from XRD and PL emphasizes its significance for the electronic properties that must be counted in the design of low-dimensional III−N devices.…”
Section: ■ Results and Discussionsupporting
confidence: 74%
“…26,34 It is comparable to but slightly lower than the peak energy of the planar and patterned c-GaN grown on SiC ranging 3.200−3.222 eV. 35 More red shift of the PL peak can imply higher tensile stress, 12,26 and the c-GaN of this work could be then in the stress greater than that on SiC in PL and indirectly confirms the tensile stress observed in XRD. Ultimately, the anisotropic stress of the c-GaN confined in a 1D groove from XRD and PL emphasizes its significance for the electronic properties that must be counted in the design of low-dimensional III−N devices.…”
Section: ■ Results and Discussionsupporting
confidence: 74%
“…Initial stage of cubic GaN for heterophase epitaxial growth induced on nanoscale v-grooved Si(001) in metal-organic vaporphase epitaxy S C Lee 1,5 , Y-B Jiang 2 , M Durniak 3 , C Wetzel 3,4 and S R J Brueck 1 For light emitting diodes (LEDs), the (100) surface in the cubic (c-) phase of III-N compound semiconductors is a nonpolar facet that does not exhibit the piezoelectric effects and impacts the efficiency of emission by removing the degradation associated with them [1]. However, the c-phase III-N is difficult to grow since it is energetically unfavorable compared with the h-phase [2].…”
mentioning
confidence: 99%
“…Therefore, a stacking fault in zincblende GaN has the same stacking sequence as the wurtzite structure, and is thought to act as nucleation sites for wurtzite inclusions. The presence of wurtzite inclusions and stacking faults has been found to be correlated by Kemper et al [48] and Martinez-Guerrero et al [32], with the wurtzite inclusions nucleating on the {111} planes.…”
Section: Zincblende Gan Growth Methodsmentioning
confidence: 88%