“…The XeCl excimer laser pumped by a pulsed discharge has the highest energy characteristics [1,2] and is distinguished by both the stability and less aggressive properties of the mixture, compared with KrF, XeF, and ArF lasers. The wide applications of XeCl excimer lasers, which are used as an intense UV radiation source, in industry and science, for example: optical microlithography, active gas cleaning, medicine, are still giving a great interest to research in this field.…”