2006
DOI: 10.1063/1.2190444
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Current transport studies of ZnO∕p-Si heterostructures grown by plasma immersion ion implantation and deposition

Abstract: Rectifying undoped and nitrogen-doped ZnO∕p-Si heterojunctions were fabricated by plasma immersion ion implantation and deposition. The undoped and nitrogen-doped ZnO films were n type (n∼1019cm−3) and highly resistive (resistivity ∼105Ωcm), respectively. While forward biasing the undoped-ZnO∕p-Si, the current follows Ohmic behavior if the applied bias Vforward is larger than ∼0.4V. However, for the nitrogen-doped-ZnO∕p-Si sample, the current is Ohmic for Vforward<1.0V and then transits to J∼V2 for Vfor… Show more

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Cited by 74 publications
(36 citation statements)
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“…9(a) for ZnCdO/p + -SiC and in Fig. 9(b) for ZnCdO/p-SiC, the slope is R S [31]. Diode series resistances in the range of 166 Ω to 3.865 kΩ depend on acceptor concentration.…”
Section: Fig 8 Diode Resistance Dv/di As a Function Of Voltage For mentioning
confidence: 99%
See 1 more Smart Citation
“…9(a) for ZnCdO/p + -SiC and in Fig. 9(b) for ZnCdO/p-SiC, the slope is R S [31]. Diode series resistances in the range of 166 Ω to 3.865 kΩ depend on acceptor concentration.…”
Section: Fig 8 Diode Resistance Dv/di As a Function Of Voltage For mentioning
confidence: 99%
“…Nevertheless, the heterojunction diode fabricated from ZnCdO grown on p + -SiC exhibited more stable rectification characteristics and higher value of I F /I R . The diode series resistance determined as Rs = dV/dI [31] is depicted in Figure 8. Below the turn-on voltage, Rs lowers with increasing the forward bias.…”
Section: Fig 6 Map Of the Lateral Cadmium Distribution For The Film mentioning
confidence: 99%
“…3 (inset) and it illustrates the current transport mechanism exhibit in a three different regions. The current in region [17,18] and in Schottky contact to ZnO nanorods [19].…”
Section: Resultsmentioning
confidence: 99%
“…Among these ZnO-based heterojunctions, ZnO/Si heterostructure is considered as the key research due to ZnO-based LEDs could be compatible with the silicon micro-electronic technology effectively. From the Anderson model of n-ZnO/p-Si heterojunction, however, the combination between the electrons and holes always occurs at the p-Si side due to the smaller conduction band offset (0.3 eV) comparing to the larger valence band offset (2.55 eV) [6,10,11]. Therefore, the interband radiative recombination in ZnO is very low and hardly ever effective UV emissions are actualized [12,13].…”
Section: Introductionmentioning
confidence: 94%