IEEE International Electron Devices Meeting 2003
DOI: 10.1109/iedm.2003.1269331
|View full text |Cite
|
Sign up to set email alerts
|

CVD-cobalt for the next generation of source/drain salicidation and contact silicidation in novel MOS device structures with complex shape

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

0
0
0

Publication Types

Select...
4

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(4 citation statements)
references
References 5 publications
0
0
0
Order By: Relevance
“…The organometallic complex Co 2 (CO) 6 (µ 2 -HCCCMe 3 ) (known as CCTBA, cobaltcarbonyltert-butylacetylene) is a common precursor for the chemical vapour deposition (CVD) and ALD of cobalt. 1,[3][4][5][6][7][8][9][10] Its high vapour pressure and relatively small molecular size enhances the performance of CCTBA as a volatile source of Co, making it desirable compared to many other Co precursors. 5 Furthermore, the synthesis of cobalt-alkyne complexes is straightforward and well-established across a wide range of alkynes.…”
Section: Introductionmentioning
confidence: 99%
“…The organometallic complex Co 2 (CO) 6 (µ 2 -HCCCMe 3 ) (known as CCTBA, cobaltcarbonyltert-butylacetylene) is a common precursor for the chemical vapour deposition (CVD) and ALD of cobalt. 1,[3][4][5][6][7][8][9][10] Its high vapour pressure and relatively small molecular size enhances the performance of CCTBA as a volatile source of Co, making it desirable compared to many other Co precursors. 5 Furthermore, the synthesis of cobalt-alkyne complexes is straightforward and well-established across a wide range of alkynes.…”
Section: Introductionmentioning
confidence: 99%
“…The organometallic complex Co 2 (CO) 6 (µ 2 -HCCCMe 3 ) (known as CCTBA, cobaltcarbonyltert-butylacetylene) is a common precursor for the chemical vapour deposition (CVD) and ALD of cobalt. 1,[3][4][5][6][7][8][9][10] Its high vapour pressure and relatively small molecular size enhances the performance of CCTBA as a volatile source of Co, making it desirable compared to many other Co precursors. 5 Furthermore, the synthesis of cobalt-alkyne complexes is straightforward and well-established across a wide range of alkynes.…”
Section: Introductionmentioning
confidence: 99%
“…The organometallic complex Co 2 (CO) 6 (µ 2 -HCCCMe 3 ) (known as CCTBA, cobaltcarbonyltert-butylacetylene) is a common precursor for the chemical vapour deposition (CVD) and ALD of cobalt. 1,[3][4][5][6][7][8][9][10] Its high vapour pressure and relatively small molecular size enhances the performance of CCTBA as a volatile source of Co, making it desirable compared to many other Co precursors. 5 Furthermore, the synthesis of cobalt-alkyne complexes is straightforward and wellestablished across a wide range of alkynes.…”
Section: Introductionmentioning
confidence: 99%