Cycle-time improvements for photolithography process in semiconductor manufacturing

Akcalt, E.; Nemoto, K.; Uzsoy, Reha

doi:10.1109/66.909654

Cited by 108 publications

(39 citation statements)

References 6 publications

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“…Better scheduling based on simulation can provide a competitive advantage of reduced production cost and cycle time [4]. There have been many researches on the system modeling and performance analysis of this kind of tools [5][6][7][8][9].…”

Section: Introductionmentioning

confidence: 99%

High-fidelity simulation of integrated single-wafer processing tools for evaluation of scheduling algorithms

Kim

Jeon²,

Kwak

et al. 2009

Robotics and Computer-Integrated Manufacturing

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Section: Introductionmentioning

confidence: 99%

High-fidelity simulation of integrated single-wafer processing tools for evaluation of scheduling algorithms

Kim

Jeon²,

Kwak

et al. 2009

Robotics and Computer-Integrated Manufacturing

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“…In recent years, modeling study of a complex photolithography process has attracted attention increasingly [3] . Several modeling methods have been proposed to represent a discrete part of photolithography processes.…”

Section: Introductionmentioning

confidence: 99%

“…A photolithography process is a complex and reentrant process and has over a hundred of processing steps. The time in the photolithography for the wafer's fabrication is about 40%−50% of the total processing time [3] . Therefore, to describe a semiconductor wafer fabrication flow availably, it is very necessary for modeling a complex photolithography process.…”

Section: Introductionmentioning

confidence: 99%

Modeling of photolithography process in semiconductor wafer fabrication systems using extended hybrid Petri nets

Zhou

Pan

Wang

et al. 2007

J Cent. South Univ. Technol.

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To describe a semiconductor wafer fabrication flow availably, a new modeling method of extended hybrid Petri nets (EHPNs) was proposed. To model the discrete part and continuous part of a complex photolithography process, hybrid Petri nets (HPNs) were introduced. To cope with the complexity of a photolithography process, object-oriented methods such as encapsulation and classifications were integrated with HPN models. EHPN definitions were presented on the basis of HPN models and object-oriented methods. Object-oriented hybrid Petri subnet models were developed for each typical physical object and an EHPN modeling procedure steps were structured. To demonstrate the feasibility and validity of the proposed modeling method, a real wafer photolithography case was used to illustrate the modeling procedure. The modeling results indicate that the EHPNs can deal with the dynamic modeling of a complex photolithography process effectively.

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“…The smaller the dimension of the IC products (wafers), the more difficult they will be to align between different layers. A study terms the dedicated constraint as machine dedication policies [1].…”

Section: Introductionmentioning

confidence: 99%

A Fuzzy Scheduling System for Dedicated Machine Constraint

Shr¹,

Liu²,

Cheng³

2006

Proceedings of the 9th Joint International Conference on Information Sciences (JCIS-06)

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In this paper, we propose the Fuzzy Scheduling System (FSS) to deal with the dedicated machine constraint. The constraint of having a dedicated machine for photolithography process is the new issue introduced in photolithography machinery due to natural bias. If we randomly schedule the wafer lots to arbitrary photolithography machines at the first photolithography stage, then the load of all photolithography machines might become unbalanced. It is the main contributor to the complexity and uncertainty of the semiconductor factory. The FSS is to select the best photolithograph machines for each wafer lot at the first, unconstrained, stage to tackle this dedicated machine constraint and to maintain the load balancing among photolithography machines.

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Cycle-time improvements for photolithography process in semiconductor manufacturing

Cited by 108 publications

References 6 publications

High-fidelity simulation of integrated single-wafer processing tools for evaluation of scheduling algorithms

High-fidelity simulation of integrated single-wafer processing tools for evaluation of scheduling algorithms

Modeling of photolithography process in semiconductor wafer fabrication systems using extended hybrid Petri nets

A Fuzzy Scheduling System for Dedicated Machine Constraint

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