Using an ab initio derived kinetic Monte Carlo model, we show that within the framework of a mechanism involving the systematic conversion of monohydrides to dihydrides and the prepairing assumption, H 2 desorption from Si͑100͒-2ϫ1 via isolated dihydrides follows first-order kinetics. Our model predicts that the kinetic order is invariant with respect to coverage, temperature, and surface features ͑e.g., steps and defects͒. However, we show that the concentration of defects on the surface has a profound effect on the desorption rate constant. The dependence of the rate constant on surface quality might explain the wide range of experimental values reported for the desorption rate constant.