Damage threshold of acrylic polymer jackets surrounded with optical fiber by UV laser

Analysis of the Photochemical Reaction on the Surface for Room Temperature Deposition of SiO2 Thin Films by Photo-CVD using Vacuum Ultraviolet Light

“…1,2) We have developed photo-CVD using vacuum ultraviolet (VUV) radiation from excimer lamps as one such new process. [3][4][5][6][7][8][9] By this method, the room temperature deposition of silica thin films has been achieved using a Xe à 2 lamp as a light source and tetraethoxyorthosilicate (TEOS: Si[OC 2 H 5 ] 4 ) as a precursor. Although in the earlier stages, the deposition rate and the electric properties of films from the VUV-CVD method were not satisfactory, we improved these by optimizing the intensity of the irradiation from the excimer lamps and the pressure of the gases in the CVD chamber.…”

Ultraviolet Nanoplasmonics: A Demonstration of Surface-Enhanced Raman Spectroscopy, Fluorescence, and Photodegradation Using Gallium Nanoparticles

“…The latter was measured as the incident field strength at which the intensity of the Raman signal stopped varying linearly with pump intensity and is consistent with the 1.5 MV/m damage threshold of acrylic polymers measured using nanosecond pulsewidth UV laser pulses at 355 nm. 30,46 For the experiments performed, g ≫ 1, reflecting a regime in which the laser intensity is well below the damage threshold so damage may only occur locally at hotspots. Based on the assumption that the local enhancement factor for Raman scattering goes as η R = g 4 , 44,47−49 the hotspot spatial distribution and corresponding Raman contribution may be obtained (Table 1).…”