2017
DOI: 10.1016/j.carbon.2017.07.072
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Damage to few-layer graphene sheets during electron field emission

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Cited by 9 publications
(5 citation statements)
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“…The highest value of 6727 was obtained for the M 1 morphology, which can be ascribed to most of the field emission sites and the lowest number of graphene layers. The 3-D NFLGs with M 2 and M 3 morphology also have a high β value, which is comparable to the reported V-FLG/V-NFLG from gaseous precursors. …”
Section: Field Emission Propertiessupporting
confidence: 77%
See 1 more Smart Citation
“…The highest value of 6727 was obtained for the M 1 morphology, which can be ascribed to most of the field emission sites and the lowest number of graphene layers. The 3-D NFLGs with M 2 and M 3 morphology also have a high β value, which is comparable to the reported V-FLG/V-NFLG from gaseous precursors. …”
Section: Field Emission Propertiessupporting
confidence: 77%
“…It is worth noting that the material with the M 3 morphology has the smoothest curve due to its high stability of the field emission. Consequently, the 3-D NFLGs with M 1 and M 2 morphology in this work have E to values lower than those of most V-FLG/V-NFLGs prepared from the commonly used PECVD from gaseous precursors. The excellent emission properties should be attributed to the nitrogen doping effect of the graphene matrix and its unique structural characteristics.…”
Section: Field Emission Propertiesmentioning
confidence: 84%
“…Furthermore, a high current density ( J ) of 8.3 mA/cm 2 was also achieved at only 2.57 V/μm applied field. Table lists the V-FLG/V-NFLG prepared by conventional PECVD from gaseous precursors. ,,, Obviously, the obtained field emission in this work is superior to the majority of the reported ones. These excellent emission properties should be attributed to nitrogen doping effect of the graphene matrix and its unique structural characteristics, which decrease the screen effect.…”
Section: Resultsmentioning
confidence: 79%
“…Among these, PECVD is considered to be a feasible method to grow V-FLG directly on a substrate. V-FLG has been grown on various substrates using PECVD with a gaseous carbon-containing precursor (usually a hydrocarbon or fluorocarbon) by Malesevic et al, , Meng et al, and Kumar et al, among others, and the related growth mechanisms of V-FLG have been systematically studied. However, there have been very few reports on the growth of V-FLG from liquid or solid precursors that are nontoxic and that do not produce hazardous byproducts.…”
Section: Introductionmentioning
confidence: 99%
“…Graphene, a subject of great interest for many domains of science and technology, has logically been considered for field emission (FE) sources simply because its single atomic edge has potentially nature's highest enhancement of electric field, thus opening perspectives for low voltage vacuum nanoelectronics. Though considerable work has been done [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15] there is a dearth of measurements on well-characterized, individual single sheet graphene layers that can guide the community towards future developments. The published work is primarily on multiemitter films or individual multilayer emitters (see Ref.…”
mentioning
confidence: 99%