1983
DOI: 10.1088/0031-8949/1983/t4/011
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Damping Effects in Angular-Resolved Ultraviolet Photoemission Spectroscopy on Cu(111)

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Cited by 21 publications
(12 citation statements)
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“…After ion bombardment the width increased to 400 meV. This increase in width, connected with increasing asymmetry into the direction of the k k -dispersion of the state, was interpreted as a disorder-induced relaxation of the sharpness of k k [107].…”
Section: Shockley States On Noble-metal Surfacesmentioning
confidence: 94%
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“…After ion bombardment the width increased to 400 meV. This increase in width, connected with increasing asymmetry into the direction of the k k -dispersion of the state, was interpreted as a disorder-induced relaxation of the sharpness of k k [107].…”
Section: Shockley States On Noble-metal Surfacesmentioning
confidence: 94%
“…It has been realized already early in the history of photoemission that both the screened and decaying hole left behind with a certain lifetime t h and the finite escape depth of the photoelectron (resulting in an uncertainty of the electron wave vector k ? perpendicular to the surface) contribute significantly to the experimentally observed lineshape [105][106][107][108]. In fact, bulk direct-transition linewidths are in most cases dominated by the final-state damping, see e.g.…”
Section: Photoemission Lineshape Analysismentioning
confidence: 99%
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“…For Cu we take IIm ,Zel = 0.4 eV which is greater than estimated in [4]. Next, let US consider the initial state band.…”
Section: (27)mentioning
confidence: 99%
“…Thus, unlike three-step model calculations, which cannot describe surface state effects, a direct comparison is possible of surface and bulk peak characteristics of the spectra. A topic of current interest is the determination of electron and hole lifetimes from measurements of values of the full width a t half maximum (FWHM) of t,he energy distribution (see [4] and [5] and references therein). The interpretation is commonly based on a Lorentzian broadening of the spectral function.…”
Section: Introductionmentioning
confidence: 99%