2022
DOI: 10.35848/1347-4065/ac4b43
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Decarboxylation efficiency of carboxylic acids as ligands of metal oxide nanocluster resists upon γ-ray irradiation

Abstract: Metal oxide nanocluster resists have recently attracted considerable attention for use in extreme ultraviolet (EUV) lithography. To obtain sophisticated guidelines for material design, it is necessary to understand well the radiation-induced chemical reaction scheme including the insolubilization mechanism. In this study, the production of CO2, which is considered to be one of the end products of treatment with an ionizing radiation, was investigated for eight types of carboxylic acid under various conditions … Show more

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Cited by 4 publications
(11 citation statements)
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“…On the basis of the results in Figs. 4-6 and the reaction mechanism reported in previous studies, 4,19,20,22) the molecular structures of end products were estimated and are shown in Fig. 7.…”
Section: Esi-ms Analysismentioning
confidence: 92%
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“…On the basis of the results in Figs. 4-6 and the reaction mechanism reported in previous studies, 4,19,20,22) the molecular structures of end products were estimated and are shown in Fig. 7.…”
Section: Esi-ms Analysismentioning
confidence: 92%
“…study. 4,19,20,22) Figure 4(a) shows the mass spectrum of the irradiated MAA aqueous solution with no additive. Under this condition, the reactions initiated by a hydrated electron and a hydroxyl radical proceed.…”
Section: Esi-ms Analysismentioning
confidence: 99%
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